journal article·2023-08-02

Selective Removal of Gold: N-Heterocyclic Carbenes as Positive Etch Resists on Planar Gold Surfaces

Florian Bosse, Christian Gutheil, D. Thao Nguyen, Matthias Freitag, Mowpriya Das, Bonnie J. Tyler, Thorsten Adolphs, Andreas H. Schäfer, Heinrich F. Arlinghaus, Frank Glorius, Bart Jan Ravoo

ACS Applied Materials & Interfaces· Volume 15· Issue 30
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Abstract

N-Heterocyclic carbene (NHC)-modified planar gold surfaces (NHC@Au) were found to be more susceptible toward wet chemical etching than undecorated surface areas. Site-selective decoration of NHCs on Au was achieved by microcontact printing (μCP) of the NHC precursors 1,3-bis(diisopropylphenyl)imidazol-3-ium hydrogen carbonate (IPr(H)[HCO 3 ]) or 1,3-dimethylbenzimidazol-3-ium hydrogen carbonate (BIMe(H)[HCO 3 ]). Strikingly, BIMe@Au showed concentration-dependent etching behavior, tunable from a positive resist to a negative resist. Surface patterning was verified by time-of-flight secondary-ion mass spectrometry and Kelvin probe force microscopy. Moreover, orthogonal μCP enabled the patterned functionalization of planar Au with both IPr and 1-eicosanethiol and the subsequent formation of three-dimensional structures with a single etching step. The selective removal of Au by functionalization with a surface ligand is unprecedented and enables novel applications of NHCs in materials chemistry and nanofabrication.
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Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Molecular Junctions and Nanostructures · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Organisch-Chemisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Corrensstraße 36, 48149 Münster, Germany

Physikalisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Wilhelm-Klemm-Straße 10, 48149 Münster, Germany

nanoAnalytics GmbH Heisenbergstraße 11, 48149 Münster, Germany

Funding

Deutsche Forschungsgemeinschaft

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