journal article·2022-09-14

Low Energy Switching of Phase Change Materials Using a 2D Thermal Boundary Layer

Jing Ning, Yunzheng Wang, Ting Yu Teo, Chung-Che Huang, Ioannis Zeimpekis, Katrina Morgan, Siew Lang Teo, Daniel W. Hewak, Michel Bosman, Robert E. Simpson

ACS Applied Materials & Interfaces· Volume 14· Issue 36
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Abstract

The switchable optical and electrical properties of phase change materials (PCMs) are finding new applications beyond data storage in reconfigurable photonic devices. However, high power heat pulses are needed to melt-quench the material from crystalline to amorphous. This is especially true in silicon photonics, where the high thermal conductivity of the waveguide material makes heating the PCM energy inefficient. Here, we improve the energy efficiency of the laser-induced phase transitions by inserting a layer of two-dimensional (2D) material, either MoS 2 or WS 2, between the silica or silicon substrate and the PCM. The 2D material reduces the required laser power by at least 40% during the amorphization (RESET) process, depending on the substrate. Thermal simulations confirm that both MoS 2 and WS 2 2D layers act as a thermal barrier, which efficiently confines energy within the PCM layer. Remarkably, the thermal insulation effect of the 2D layer is equivalent to a ∼100 nm layer of SiO 2 . The high thermal boundary resistance induced by the van der Waals (vdW)-bonded layers limits the thermal diffusion through the layer interface. Hence, 2D materials with stable vdW interfaces can be used to improve the thermal efficiency of PCM-tuned Si photonic devices. Furthermore, our waveguide simulations show that the 2D layer does not affect the propagating mode in the Si waveguide; thus, this simple additional thin film produces a substantial energy efficiency improvement without degrading the optical performance of the waveguide. Our findings pave the way for energy-efficient laser-induced structural phase transitions in PCM-based reconfigurable photonic devices.
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Research context

OpenAlex topics: Phase-change materials and chalcogenides · Nonlinear Optical Materials Studies · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore

Department of Materials Science & Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore

Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom

Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis 138634, Singapore

Funding

Engineering and Physical Sciences Research Council · Agency for Science, Technology and Research · Ministry of Education - Singapore

References (63)

Show source-provided references
1. 10.1007/s00339-007-3931-y10.1007/s00339-007-3931-y ↗
2. 10.1038/nmat233010.1038/nmat2330 ↗
3. 10.1038/nmat293410.1038/nmat2934 ↗
4. 10.1038/nmat121510.1038/nmat1215 ↗
5. 10.1126/science.120193810.1126/science.1201938 ↗
6. 10.1063/1.495315810.1063/1.4953158 ↗
7. 10.1038/s41578-018-0076-x10.1038/s41578-018-0076-x ↗
8. Ohta T. · J. Optoelectron. Adv. Mater. · 2001 · 3 · 609
9. Hruska, J. Intel, Micron Reveal Xpoint, a New Memory Architecture That Could Outclass DDR4 and NAND. https://www.extremetech.com/extreme/211087-intel-micron-reveal-xpoint-a-new-memory-architecture-that-claims-to-outclass-both-ddr4-and-nand.
10. 10.1038/nnano.2016.7010.1038/nnano.2016.70 ↗
11. Sadeghipour, S. M.; Pileggi, L.; Asheghi, M. Phase Change Random Access Memory, Thermal Analysis.Thermal and Thermomechanical Proceedings 10th Intersociety Conference on Phenomena in Electronics Systems, San Diego, CA, May 30–June 2, 2006; pp 660–665.10.1109/ITHERM.2006.1645408 ↗
12. Ha, Y.; Yi, J.; Horii, H.; Park, J.; Joo, S.; Park, S.; Chung, U.I.; Moon, J. An Edge Contact Type Cell for Phase Change RAM Featuring Very Low Power Consumption.Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No. 03CH37407), Kyoto, Japan, June 10–12, 2003; pp 175–176.10.1109/VLSIT.2003.1221142 ↗
13. Chen, Y.; Rettner, C.; Raoux, S.; Burr, G.; Chen, S.; Shelby, R.; Salinga, M.; Risk, W.; Happ, T.; McClelland, G., Ultra-thin Phase-change Bridge Memory Device Using GeSb.2006 International Electron Devices Meeting, San Francisco, December 11–13, 2006; pp 1–4.10.1109/IEDM.2006.346910 ↗
14. Pellizzer, F.; Benvenuti, A.; Gleixner, B.; Kim, Y.; Johnson, B.; Magistretti, M.; Marangon, T.; Pirovano, A.; Bez, R.; Atwood, G. A 90nm Phase Change Memory Technology for Stand-alone Non-volatile Memory Applications.2006 Symposium on VLSI Technology, Honolulu, HI, June 13–15, 2006; pp 122–123.
15. 10.1063/1.501287210.1063/1.5012872 ↗
16. 10.1063/1.486343010.1063/1.4863430 ↗
17. 10.1021/am503502q10.1021/am503502q ↗
18. 10.1063/1.493684710.1063/1.4936847 ↗
19. 10.1021/acsami.5b0008310.1021/acsami.5b00083 ↗
20. 10.1016/j.actamat.2011.03.05710.1016/j.actamat.2011.03.057 ↗
21. 10.1063/1.218119110.1063/1.2181191 ↗
22. 10.1038/nnano.2011.9610.1038/nnano.2011.96 ↗
23. 10.1038/ncomms1198310.1038/ncomms11983 ↗
24. 10.1002/adma.20150586510.1002/adma.201505865 ↗
25. 10.1088/2399-1984/aa843410.1088/2399-1984/aa8434 ↗
26. Matsui, Y.; Kurotsuchi, K.; Tonomura, O.; Morikawa, T.; Kinoshita, M.; Fujisaki, Y.; Matsuzaki, N.; Hanzawa, S.; Terao, M.; Takaura, N., Ta2O5Interfacial Layer between GST and W Plug Enabling Low Power Operation of Phase Change Memories.2006 International Electron Devices Meeting, San Francisco, CA, December 11–13, 2006; pp 1–4.10.1109/IEDM.2006.346908 ↗
27. 10.1063/1.283000210.1063/1.2830002 ↗
28. 10.1088/0957-4484/19/44/44570610.1088/0957-4484/19/44/445706 ↗
29. 10.1063/1.284165510.1063/1.2841655 ↗
30. 10.1109/LED.2020.302827110.1109/LED.2020.3028271 ↗
31. 10.1063/1.482471410.1063/1.4824714 ↗
32. 10.1038/nphoton.2015.18210.1038/nphoton.2015.182 ↗
33. 10.1038/nphoton.2017.12610.1038/nphoton.2017.126 ↗
34. 10.1364/OME.3.00110110.1364/OME.3.001101 ↗
35. 10.1021/acsnano.1c0711410.1021/acsnano.1c07114 ↗
36. 10.1021/acs.nanolett.5b0266110.1021/acs.nanolett.5b02661 ↗
37. 10.1063/1.508095910.1063/1.5080959 ↗
38. 10.1038/s41578-019-0159-310.1038/s41578-019-0159-3 ↗
39. 10.1063/1.503114710.1063/1.5031147 ↗
40. 10.1002/adfm.20180618110.1002/adfm.201806181 ↗
41. 10.1039/C9NH00414A10.1039/C9NH00414A ↗
42. 10.1039/C8NR00719E10.1039/C8NR00719E ↗
43. 10.1021/acsami.6b0507110.1021/acsami.6b05071 ↗
44. 10.1364/OME.7.00374110.1364/OME.7.003741 ↗
45. 10.1007/10681727_83410.1007/10681727_834 ↗
46. Haynes W. · 2015
47. 10.1063/1.509228710.1063/1.5092287 ↗
48. 10.1021/acs.nanolett.6b0351310.1021/acs.nanolett.6b03513 ↗
49. 10.1364/OL.41.00117710.1364/OL.41.001177 ↗
50. 10.1103/PhysRevB.101.21430510.1103/PhysRevB.101.214305 ↗
51. 10.1103/PhysRevApplied.13.03405910.1103/PhysRevApplied.13.034059 ↗
52. 10.1021/acs.jpcc.1c0284210.1021/acs.jpcc.1c02842 ↗
53. 10.1364/OME.44728910.1364/OME.447289 ↗
54. 10.1021/acsphotonics.8b0162810.1021/acsphotonics.8b01628 ↗
55. Edwards D. F. · 1997 · 54710.1016/B978-012544415-6.50027-3 ↗
56. 10.1038/s41598-020-71808-y10.1038/s41598-020-71808-y ↗
57. Tuschel D. · Spectroscopy · 2015 · 30 · 14
58. 10.1007/s11249-011-9774-x10.1007/s11249-011-9774-x ↗
59. Andrikopoulos K. · J. Phys.: Condens. Matter · 2006 · 18 · 965
60. 10.1038/srep0175510.1038/srep01755 ↗
61. 10.1038/srep1115010.1038/srep11150 ↗
62. 10.1116/1.330157910.1116/1.3301579 ↗
63. 10.1038/s41565-021-00881-910.1038/s41565-021-00881-9 ↗