A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song; Tsukasa Takahashi; Sejung Kim; Yvonne C. Heaney; John Warner; Shaochen Chen; Michael J. Heller

doi:10.1021/acsami.6b11361

journal article·2017-01-11

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song, Tsukasa Takahashi, Sejung Kim, Yvonne C. Heaney, John Warner, Shaochen Chen, Michael J. Heller

ACS Applied Materials & Interfaces· Volume 9· Issue 1

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Source abstract

Abstract

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

Source: openalex_inverted_index · Quality: baseline

Research context

Nanomaterials

OpenAlex topics: Advanced biosensing and bioanalysis techniques · Biosensors and Analytical Detection · DNA and Nucleic Acid Chemistry

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical and Computer Engineering, ‡Department of Mechanical Engineering, §Department of Materials Science and Engineering, ∥Department of Nanoengineering, and ⊥Department of Bioengineering, University of California San Diego, La Jolla, California 92093-0448, United States

Funding

Division of Civil, Mechanical and Manufacturing Innovation

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