Tuning the Properties of Thin-Film TaRu for Hydrogen-Sensing Applications
Source abstract
Abstract
High Resolution Image Download MS PowerPoint Slide Accurate, cost-efficient, and safe hydrogen sensors will play a key role in the future hydrogen economy. Optical hydrogen sensors based on metal hydrides are attractive owing to their small size and costs and the fact that they are intrinsically safe. These sensors rely on suitable sensing materials, of which the optical properties change when they absorb hydrogen if they are in contact with a hydrogen-containing environment. Here, we illustrate how we can use alloying to tune the properties of hydrogen-sensing materials by considering thin films consisting of tantalum doped with ruthenium. Using a combination of optical transmission measurements, ex situ and in situ X-ray diffraction, and neutron and X-ray reflectometry, we show that introducing Ru in Ta results in a solid solution of Ta and Ru up to at least 30% Ru. The alloying has two major effects: the compression of the unit cell with increasing Ru doping modifies the enthalpy of hydrogenation and thereby shifts the pressure window in which the material absorbs hydrogen to higher hydrogen concentrations, and it reduces the amount of hydrogen absorbed by the material. This allows one to tune the pressure/concentration window of the sensor and its sensitivity and makes Ta 1– y Ru y an ideal hysteresis-free tunable hydrogen-sensing material with a sensing range of >7 orders of magnitude in pressure. In a more general perspective, these results demonstrate that one can rationally tune the properties of metal hydride optical hydrogen-sensing layers by appropriate alloying.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · Metal and Thin Film Mechanics · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Faculty of Applied Sciences, Delft University of Technology, Mekelweg 15, 2629 JBDelft, The Netherlands
ISIS Neutron Source, Rutherford Appleton Laboratory, STFC, UKRI, OX11 0QXDidcot, United Kingdom
References (50)
Show source-provided references
1. 10.1098/rsta.2016.040010.1098/rsta.2016.0400 ↗
2. 10.1038/s41563-018-0129-y10.1038/s41563-018-0129-y ↗
3. 10.1016/j.ijhydene.2019.04.06810.1016/j.ijhydene.2019.04.068 ↗
4. 10.1038/s41560-019-0326-110.1038/s41560-019-0326-1 ↗
5. 10.1016/j.ijhydene.2015.12.21610.1016/j.ijhydene.2015.12.216 ↗
6. 10.1021/acs.jpcc.0c0180610.1021/acs.jpcc.0c01806 ↗
7. 10.1016/j.snb.2011.04.07010.1016/j.snb.2011.04.070 ↗
8. 10.1021/nn505804f10.1021/nn505804f ↗
9. 10.7566/JPSJ.89.05100310.7566/JPSJ.89.051003 ↗
10. 10.1016/j.ijhydene.2020.08.11910.1016/j.ijhydene.2020.08.119 ↗
11. 10.1021/acssensors.0c0201910.1021/acssensors.0c02019 ↗
12. 10.1021/acsnano.0c0530710.1021/acsnano.0c05307 ↗
13. 10.1016/j.optlastec.2020.10680810.1016/j.optlastec.2020.106808 ↗
14. 10.1016/j.snb.2005.03.07010.1016/j.snb.2005.03.070 ↗
15. 10.1016/j.ijhydene.2012.12.14610.1016/j.ijhydene.2012.12.146 ↗
16. 10.1021/acs.nanolett.5b0105310.1021/acs.nanolett.5b01053 ↗
17. 10.1021/acsnano.8b0283510.1021/acsnano.8b02835 ↗
18. 10.1021/acssensors.9b0061010.1021/acssensors.9b00610 ↗
19. 10.1038/s41563-019-0325-410.1038/s41563-019-0325-4 ↗
20. 10.1021/acsami.8b2245510.1021/acsami.8b22455 ↗
21. 10.1021/acsami.9b1424410.1021/acsami.9b14244 ↗
22. 10.1038/ncomms1571810.1038/ncomms15718 ↗
23. 10.1016/j.snb.2018.12.02910.1016/j.snb.2018.12.029 ↗
24. 10.1002/adfm.20201048310.1002/adfm.202010483 ↗
25. 10.1021/acs.jpclett.1c0341110.1021/acs.jpclett.1c03411 ↗
26. 10.1021/acsami.1c1324010.1021/acsami.1c13240 ↗
27. Bannenberg, L. J.; Blom, L.; Sakaki, K.; Asano, K.; Schreuders, H.Completely elastic deformation of hydrogenated Ta thin films. 2023, submitted for publication.10.1021/acsmaterialslett.3c00038 ↗
28. 10.1515/ijmr-1963-54080410.1515/ijmr-1963-540804 ↗
29. 10.1007/BF0264994010.1007/BF02649940 ↗
30. 10.1088/0305-4608/15/4/02410.1088/0305-4608/15/4/024 ↗
31. Slaman M. · Proc. SPIE Photonic Appl. Aerosp., Transp., Harsh Environ. III · 2012 · 836805
32. 10.1002/anie.20140691110.1002/anie.201406911 ↗
33. 10.1107/S002188980704508610.1107/S0021889807045086 ↗
34. 10.1016/j.physb.2010.11.03110.1016/j.physb.2010.11.031 ↗
35. Bannenberg, L. J.; Exeter, M.; Verleg, M.; Van der Wal, E.; Boshuizen, B.; Thijs, M.; Parnell, S. R.; Schreuders, H.Versatile pressure and temperature controlled cell for neutron reflectometry and small-angle neutron scattering. 2023, submitted for publication.10.3233/JNR-230004 ↗
36. 10.1107/S160057672200665310.1107/S1600576722006653 ↗
37. 10.1080/1044863920821877010.1080/10448639208218770 ↗
38. 10.1021/acs.jpcc.6b0230210.1021/acs.jpcc.6b02302 ↗
39. 10.1002/adma.20060256010.1002/adma.200602560 ↗
40. 10.1016/j.scriptamat.2008.11.01210.1016/j.scriptamat.2008.11.012 ↗
41. 10.1016/j.ijhydene.2010.12.06310.1016/j.ijhydene.2010.12.063 ↗
42. 10.1146/annurev.matsci.36.090804.09445110.1146/annurev.matsci.36.090804.094451 ↗
43. 10.1039/c3cp44441d10.1039/c3cp44441d ↗
44. 10.1103/PhysRevLett.121.25550310.1103/PhysRevLett.121.255503 ↗
45. 10.1021/acs.nanolett.6b0246710.1021/acs.nanolett.6b02467 ↗
46. 10.1002/cphc.20190024710.1002/cphc.201900247 ↗
47. 10.1007/BF0264992210.1007/BF02649922 ↗
48. 10.1002/bbpc.1972076080810.1002/bbpc.19720760808 ↗
49. 10.1039/tf971670029710.1039/tf9716700297 ↗
50. 10.1063/1.352946510.1063/1.3529465 ↗