Tunable Resistive Switching Enabled by Malleable Redox Reaction in the Nano-Vacuum Gap
Source abstract
Abstract
Neuromorphic computing has emerged as a highly promising alternative to conventional computing. The key to constructing a large-scale neural network in hardware for neuromorphic computing is to develop artificial neurons with leaky integrate-and-fire behavior and artificial synapses with synaptic plasticity using nanodevices. So far, these two basic computing elements have been built in separate devices using different materials and technologies, which poses a significant challenge to system design and manufacturing. In this work, we designed a resistive device embedded with an innovative nano-vacuum gap between a bottom electrode and a mixed-ionic-electronic-conductor (MIEC) layer. Through redox reaction on the MIEC surface, metallic filaments dynamically grew within the nano-vacuum gap. The nano-vacuum gap provided an additional control factor for controlling the evolution dynamics of metallic filaments by tuning the electron tunneling efficiency, in analogy to a pseudo-three-terminal device, resulting in tunable switching behavior in various forms from volatile to nonvolatile switching in a single device. Our device demonstrated cross-functions, in particular, tunable neuronal firing and synaptic plasticity on demand, providing seamless integration for building large-scale artificial neural networks for neuromorphic computing.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Photoreceptor and optogenetics research · Ferroelectric and Negative Capacitance Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372, Singapore
Funding
Ministry of Education - Singapore · Science and Engineering Research Council
References (47)
Show source-provided references
1. Zhang B. · Sci. Robot. · 2016 · 3
2. 10.1038/s41563-019-0291-x10.1038/s41563-019-0291-x ↗
3. 10.1038/s41928-017-0006-810.1038/s41928-017-0006-8 ↗
4. 10.1038/s41565-018-0302-010.1038/s41565-018-0302-0 ↗
5. 10.1002/adma.20180235310.1002/adma.201802353 ↗
6. 10.1109/JPROC.2015.244409410.1109/JPROC.2015.2444094 ↗
7. 10.1038/s41467-018-05677-510.1038/s41467-018-05677-5 ↗
8. 10.1038/s41928-019-0221-610.1038/s41928-019-0221-6 ↗
9. 10.1126/sciadv.aat475210.1126/sciadv.aat4752 ↗
10. 10.1021/nl201040y10.1021/nl201040y ↗
11. 10.1038/nnano.2016.7010.1038/nnano.2016.70 ↗
12. 10.1002/adma.20090368010.1002/adma.200903680 ↗
13. 10.1002/adfm.20160474010.1002/adfm.201604740 ↗
14. 10.1038/nmat351010.1038/nmat3510 ↗
15. 10.1109/LED.2016.264281810.1109/LED.2016.2642818 ↗
16. Sengupta, A.; Roy, K. Spin-Transfer Torque Magnetic Neuron for Low Power Neuromorphic Computing. Proceedings of the International Joint Conference on Neural Networks, 2015; Vol. 2015-Sept.10.1109/IJCNN.2015.7280306 ↗
17. 10.1109/TBCAS.2015.241442310.1109/TBCAS.2015.2414423 ↗
18. 10.1002/smll.20180218810.1002/smll.201802188 ↗
19. 10.1038/s41928-018-0023-210.1038/s41928-018-0023-2 ↗
20. 10.1038/nmat475610.1038/nmat4756 ↗
21. 10.1021/am403497y10.1021/am403497y ↗
22. 10.1039/c6nr01383j10.1039/c6nr01383j ↗
23. 10.1038/nmat345610.1038/nmat3456 ↗
24. 10.1002/adfm.20170692710.1002/adfm.201706927 ↗
25. 10.1039/c5nr02891d10.1039/c5nr02891d ↗
26. 10.1002/adma.20160445710.1002/adma.201604457 ↗
27. 10.1021/acsami.7b1723510.1021/acsami.7b17235 ↗
28. 10.1109/LED.2012.221018510.1109/LED.2012.2210185 ↗
29. 10.1063/1.367323910.1063/1.3673239 ↗
30. 10.1002/adma.20120368010.1002/adma.201203680 ↗
31. 10.1186/s11671-015-0771-010.1186/s11671-015-0771-0 ↗
32. Lee, S. R.; Kim, Y. B.; Chang, M.; Kim, K. M.; Lee, C. B.; Hur, J. H.; Park, G. S.; Lee, D.; Lee, M. J.; Kim, C. J.; Chung, U.I.; Yoo, I. K.; Kim, K. Multi-Level Switching of Triple-Layered TaOx RRAM with Excellent Reliability for Storage Class Memory. Digest of Technical Papers—Symposium on VLSI Technology, 2012; pp 71–72.10.1109/VLSIT.2012.6242466 ↗
33. Bricalli, A.; Ambrosi, E.; Laudato, M.; Maestro, M.; Rodriguez, R.; Ielmini, D. SiOx-Based Resistive Switching Memory (RRAM) for Crossbar Storage/Select Elements with High on/off Ratio. Technical Digest—International Electron Devices Meeting; IEDM, 2017; p 4.3.1–4.3.4.10.1109/IEDM.2016.7838344 ↗
34. 10.1109/LED.2013.229012010.1109/LED.2013.2290120 ↗
35. 10.1016/j.carbon.2015.04.03110.1016/j.carbon.2015.04.031 ↗
36. 10.1109/LED.2016.254036110.1109/LED.2016.2540361 ↗
37. 10.1002/adfm.20160481110.1002/adfm.201604811 ↗
38. 10.1038/am.2017.510.1038/am.2017.5 ↗
39. 10.1007/s00404-009-1012-510.1007/s00404-009-1012-5 ↗
40. Shukla, N.; Grisafe, B.; Ghosh, R. K.; Jao, N.; Aziz, A.; Frougier, J.; Jerry, M.; Sonde, S.; Rouvimov, S.; Orlova, T.; Gupta, S.; Datta, S. Ag/HfO2 based Threshold Switch with Extreme Non-Linearity for Unipolar Cross-Point Memory and Steep-Slope Phase-FETs. Technical Digest—International Electron Devices Meeting; IEDM, 2017; p 34.6.1–34.6.4.10.1109/IEDM.2016.7838542 ↗
41. 10.1021/nn202983n10.1021/nn202983n ↗
42. 10.1038/nature0319010.1038/nature03190 ↗
43. 10.1088/1468-6996/12/1/01300310.1088/1468-6996/12/1/013003 ↗
44. 10.1038/nmat330710.1038/nmat3307 ↗
45. 10.1038/ncomms278410.1038/ncomms2784 ↗
46. 10.1155/2014/57816810.1155/2014/578168 ↗
47. 10.1149/1.209578710.1149/1.2095787 ↗