journal article·2020-10-21Open access

Covalent Grafting of Polyoxometalate Hybrids onto Flat Silicon/Silicon Oxide: Insights from POMs Layers on Oxides

Maxime Laurans, Kelly Trinh, Kevin Dalla Francesca, Guillaume Izzet, Sandra Alves, Etienne Derat, Vincent Humblot, Olivier Pluchery, Dominique Vuillaume, Stéphane Lenfant, Florence Volatron, Anna Proust

ACS Applied Materials & Interfaces· Volume 12· Issue 42

Abstract

Immobilization of polyoxometalates (POMs) onto oxides is relevant to many applications in the fields of catalysis, energy conversion/storage, or molecular electronics. Optimization and understanding the molecule/oxide interface is crucial to rationally improve the performance of the final molecular materials. We herein describe the synthesis and covalent grafting of POM hybrids with remote carboxylic acid functions onto flat Si/SiO2 substrates. Special attention has been paid to the characterization of the molecular layer and to the description of the POM anchoring mode at the oxide interface through the use of various characterization techniques, including ellipsometry, AFM, XPS, and FTIR. Finally, electron transport properties were probed in a vertical junction configuration and energy level diagrams have been drawn and discussed in relation with the POM molecular electronic features inferred from cyclic-voltammetry, UV–visible absorption spectra, and theoretical calculations. The electronic properties of these POM-based molecular junctions are driven by the POM LUMO (d-orbitals) whatever the nature of the tether or the anchoring group.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Polyoxometalates: Synthesis and Applications · Conducting polymers and applications · Advanced Nanomaterials in Catalysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Sorbonne Université, CNRS, Institut Parisien de Chimie Moléculaire, IPCM, 4 Place Jussieu, F-75005 Paris, France

Sorbonne Université, CNRS, Institut des Nanosciences de Paris, INSP, 4 Place Jussieu, F-75005 Paris, France

Sorbonne Université, CNRS, Laboratoire de Réactivité de Surface, LRS, 4 Place Jussieu, F-75005 Paris, France

Institute for Electronics Microelectronics and Nanotechnology (IEMN), CNRS, Avenue Poincaré, F-59652 Villeneuve d’Ascq, France

Funding

Centre National de la Recherche Scientifique

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