journal article·2020-08-26

Rapid Defrost Transparent Thin-Film Heater with Flexibility and Chemical Stability

Joohee Jang, Narendra S. Parmar, Won-Kook Choi, Ji-Won Choi

ACS Applied Materials & Interfaces· Volume 12· Issue 34
Publisher page

Abstract

Zn-doped SnOx/Ag/Zn-doped SnOx(ZTO/Ag/ZTO) multilayer thin films fabricated on a polyethylene terephthalate (PET) substrate using an optimized N2-to-(Ar + O2) gas ratio are used for transparent thin-film heaters with high performance and chemical stability. The ZTO/Ag/ZTO-based multilayer thin film exhibits enhanced durability at high temperatures and humid environments by incorporating nitrogen. The bending test results-there was no significant change in the sheet resistance even after 10,000 bending cycles-highlight the mechanical flexibility of the ZTO/Ag/ZTO multilayer thin film. The ZTO/Ag/ZTO-based thin-film heater on PET, fabricated under optimized deposition gas conditions, exhibits a fast thermal response time of 30 s and a low driving voltage of 6 V to attain 100 °C. It also exhibits uniform heat distribution at saturated temperature and chemical stability after 100 heating-cooling cycles. Hence, the proposed ZTO/Ag/ZTO-based thin-film heater is applicable for use in front and rear window automobile and building applications.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Advanced Sensor Technologies Research · Electronic Packaging and Soldering Technologies · Nanomaterials and Printing Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center for Electronic Materials, Korea Institute of Science and Technology (KIST), 5, Hwarang-ro 14 gil, Seongbuk-gu, Seoul 02792, Republic of Korea

Division of Nano & Information Technology, KIST School, University of Science and Technology (UST), 217, Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea

Center for Opto-Electronic Materials and Devices, Korea Institute of Science and Technology (KIST), 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul 02792, Republic of Korea

Funding

the Korea Institute of Science and Technology Future Resource Program

References (49)

Show source-provided references
1. 10.1021/acsami.5b1102610.1021/acsami.5b11026 ↗
2. 10.4191/kcers.2016.53.1.11010.4191/kcers.2016.53.1.110 ↗
3. 10.1039/c8tc04423f10.1039/c8tc04423f ↗
4. 10.1038/srep4125010.1038/srep41250 ↗
5. 10.1515/rams-2018-000610.1515/rams-2018-0006 ↗
6. 10.1002/adfm.20160528610.1002/adfm.201605286 ↗
7. 10.1016/j.spmi.2010.08.01110.1016/j.spmi.2010.08.011 ↗
8. 10.4313/teem.2016.17.1.3310.4313/teem.2016.17.1.33 ↗
9. 10.1007/s10008-002-0313-410.1007/s10008-002-0313-4 ↗
10. 10.1557/mrs2007.2910.1557/mrs2007.29 ↗
11. 10.1039/c6ra08704c10.1039/c6ra08704c ↗
12. 10.1039/c8ra03252a10.1039/c8ra03252a ↗
13. 10.1038/srep3386810.1038/srep33868 ↗
14. 10.1007/s10853-019-03376-010.1007/s10853-019-03376-0 ↗
15. 10.1063/1.12605210.1063/1.126052 ↗
16. Hosono H. · 2011
17. 10.1088/0268-1242/20/4/00410.1088/0268-1242/20/4/004 ↗
18. 10.1088/0022-3727/43/46/46540310.1088/0022-3727/43/46/465403 ↗
19. 10.1088/0022-3727/42/13/13980110.1088/0022-3727/42/13/139801 ↗
20. 10.3390/coatings404073210.3390/coatings4040732 ↗
21. 10.1016/s0169-4332(02)00014-410.1016/s0169-4332(02)00014-4 ↗
22. 10.1038/ncomms352210.1038/ncomms3522 ↗
23. 10.1002/adma.20150091710.1002/adma.201500917 ↗
24. 10.1039/c5ra06529a10.1039/c5ra06529a ↗
25. 10.1007/s12274-016-1261-010.1007/s12274-016-1261-0 ↗
26. 10.1021/acsnano.9b0043410.1021/acsnano.9b00434 ↗
27. 10.1016/j.compscitech.2016.07.01110.1016/j.compscitech.2016.07.011 ↗
28. 10.1039/c4ra06811d10.1039/c4ra06811d ↗
29. 10.1002/smll.20160030910.1002/smll.201600309 ↗
30. 10.1016/j.apsusc.2014.12.01710.1016/j.apsusc.2014.12.017 ↗
31. 10.1016/j.tsf.2013.11.10910.1016/j.tsf.2013.11.109 ↗
32. 10.1038/s41598-017-00178-910.1038/s41598-017-00178-9 ↗
33. 10.1016/j.ceramint.2015.10.14610.1016/j.ceramint.2015.10.146 ↗
34. 10.1016/j.optcom.2008.10.07510.1016/j.optcom.2008.10.075 ↗
35. 10.1016/j.matlet.2012.06.10810.1016/j.matlet.2012.06.108 ↗
36. 10.1063/1.282978810.1063/1.2829788 ↗
37. Wissmann P. · 200710.1007/3-540-48490-6 ↗
38. Adams D. · 2008
39. 10.1016/j.tsf.2012.05.03310.1016/j.tsf.2012.05.033 ↗
40. 10.1016/j.jallcom.2016.09.29310.1016/j.jallcom.2016.09.293 ↗
41. 10.1016/j.tsf.2013.05.06910.1016/j.tsf.2013.05.069 ↗
42. 10.1111/j.1551-2916.2011.04845.x10.1111/j.1551-2916.2011.04845.x ↗
43. 10.1007/s00339-006-3659-010.1007/s00339-006-3659-0 ↗
44. 10.1021/acs.chemmater.6b0288810.1021/acs.chemmater.6b02888 ↗
45. 10.1016/j.elspec.2003.12.00410.1016/j.elspec.2003.12.004 ↗
46. 10.1107/s002188980300495310.1107/s0021889803004953 ↗
47. 10.1116/1.487612710.1116/1.4876127 ↗
48. 10.1039/c4ra10667a10.1039/c4ra10667a ↗
49. 10.1002/adfm.20120115510.1002/adfm.201201155 ↗