Preparation and Performance of Si₃N₄ Hollow Microspheres by the Template Method and Carbothermal Reduction Nitridation

Silicon nitride (Si3N4) hollow microspheres with smaller particle size and narrower distribution can be used to prepare closed-cell ceramics as the pore-forming agent to improve heat insulation performance and wave-transparent performance of porous Si3N4 ceramics. In this work, Si3N4 hollow microspheres with a diameter of about 1 μm and a wall thickness of approximately 150 nm were prepared by using the template method combined with the carbothermal reduction nitridation method. The optimum preparation temperature of the Si3N4 hollow microspheres is 1450 °C. The morphology, microstructure, and phase composition of the prepared Si3N4 hollow microspheres were characterized. The formation mechanism of the Si3N4 hollow microspheres was discussed. The dielectric properties of Si3N4 hollow microspheres were measured using the waveguide method at 8.2–12.4 GHz. The results show that the wave-transparent performance of the Si3N4 hollow microspheres is similar to those of α-Si3N4 particles. It can be used as the pore-forming agent or matrix for preparing lightweight, heat-insulating, wave-transparent, and high-strength porous Si3N4 ceramics.