Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(diethylallylphosphate) Coating: A Char-Forming Protective Coating for Cellulosic Textile
Source abstract
Abstract
An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Surface Modification and Superhydrophobicity · Plasma Applications and Diagnostics · Electrohydrodynamics and Fluid Dynamics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Science and Analysis of Materials Department , Centre de Recherche Public−Gabriel Lippmann, Belvaux L-4422, Luxembourg
Laboratory of Inorganic Chemistry, ETH Zürich, 8093 Zürich, Switzerland
Funding
Fonds National de la Recherche Luxembourg
References (33)
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