journal article·2018-02-14

Evaluation of Transport Parameters in MoS2/Graphene Junction Devices Fabricated by Chemical Vapor Deposition

Young Chul Kim, Van Tu Nguyen, Soonil Lee, Ji-Yong Park, Yeong Hwan Ahn

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Abstract

We demonstrated imaging of the depletion layer in a MoS 2 /graphene heterojunction fabricated by chemical vapor deposition and obtained their transport parameters such as diffusion length, lifetime, and mobility by using scanning photocurrent microscopy (SPCM). The device exhibited a n-type operation, which was determined by the MoS 2 layer with a lower mobility. The SPCM revealed the presence of the depletion layer at the heterojunction, whereas graphene provided an excellent electrical contact for the MoS 2 layer without resulting in a rectifying behavior, even if they were anchored within a very short range. The polarity of the photocurrent signal switched when we applied a drain–source bias voltage, from which we extracted the potential barrier at the junction. More importantly, a bias-dependent SPCM allowed us to simultaneously record the diffusion lengths of both majority and minority carriers for the respective MoS 2 and graphene layers. By combining the diffusion lengths with the lifetimes measured by femtosecond SPCM, we determined the electron and hole mobilities in each layer, from which we found that the electron mobility (160 cm 2 V –1 s –1 ) was higher than the hole mobility (80 cm 2 V –1 s –1 ) in MoS 2, whereas the hole mobility (15 000 cm 2 V –1 s –1 ) was relatively higher in graphene.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics and Department of Energy Systems Research, Ajou University, Suwon 16499, Korea

Funding

National Research Foundation of Korea · Korea Institute of Energy Technology Evaluation and Planning

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