journal article·2017-10-04

Structurally Engineered Nanoporous Ta2O5–x Selector-Less Memristor for High Uniformity and Low Power Consumption

Soonbang Kwon, Tae-Wook Kim, Seonghoon Jang, Jae-Hwang Lee, Nam Dong Kim, Yongsung Ji, Chul-Ho Lee, James M. Tour, Gunuk Wang

Publisher page

Abstract

A memristor architecture based on metal-oxide materials would have great promise in achieving exceptional energy efficiency and higher scalability in next-generation electronic memory systems. Here, we propose a facile method for fabricating selector-less memristor arrays using an engineered nanoporous Ta 2 O 5– x architecture. The device was fabricated in the form of crossbar arrays, and it functions as a switchable rectifier with a self-embedded nonlinear switching behavior and ultralow power consumption (∼2.7 × 10 –6 W), which results in effective suppression of crosstalk interference. In addition, we determined that the essential switching elements, such as the programming power, the sneak current, the nonlinearity value, and the device-to-device uniformity, could be enhanced by in-depth structural engineering of the pores in the Ta 2 O 5– x layer. Our results, on the basis of the structural engineering of metal-oxide materials, could provide an attractive approach for fabricating simple and cost-efficient memristor arrays with acceptable device uniformity and low power consumption without the need for additional addressing selectors.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

KU-KIST Graduate School of Converging Science & Technology, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 136-701, Republic of Korea

Applied Quantum Composites Research Center, Institute of Advanced Composite Materials, Korea Institute of Science and Technology, Wanju, Jeollabuk-do 55324, Republic of Korea

Department of Mechanical and Industrial Engineering, University of Massachusetts, Amherst, Massachusetts 01003, United States

Department of Chemistry, Department of Material Science and NanoEngineering, and Department of Computer Science, Rice University, 6100 Main Street, Houston, Texas 77005, United States

Funding

National Research Foundation of Korea · Korea Institute of Science and Technology · Korea University · Samsung Electronics Co., Ltd.

References (43)

Show source-provided references
1. 10.1038/nature0693210.1038/nature06932 ↗
2. 10.1038/nmat307010.1038/nmat3070 ↗
3. 10.1038/nnano.2012.24010.1038/nnano.2012.240 ↗
4. 10.1021/nl401287w10.1021/nl401287w ↗
5. 10.1038/nnano.2015.22110.1038/nnano.2015.221 ↗
6. 10.1002/adma.20130204710.1002/adma.201302047 ↗
7. 10.1038/ncomms362910.1038/ncomms3629 ↗
8. 10.1002/adma.20140367510.1002/adma.201403675 ↗
9. 10.1002/adfm.20130352010.1002/adfm.201303520 ↗
10. 10.1021/nl203687n10.1021/nl203687n ↗
11. 10.1038/ncomms370710.1038/ncomms3707 ↗
12. 10.1002/adma.20080379810.1002/adma.200803798 ↗
13. 10.1021/nn501824r10.1021/nn501824r ↗
14. Huang, J.J.; Tseng, Y.M.; Luo, W.C.; Hsu, C.W.; Hou, T.H.InOne Selector-One Resistor (1S1R) Crossbar Array for High-Density Flexible Memory Applications. Proceedings of 2011 IEEE International Electron Devices Meeting;IEEE International, 2011; pp31.7.1–31.7.4.10.1109/IEDM.2011.6131653 ↗
15. 10.1021/acs.nanolett.5b0219010.1021/acs.nanolett.5b02190 ↗
16. 10.1109/TED.2012.222514710.1109/TED.2012.2225147 ↗
17. 10.1021/acsnano.6b0271110.1021/acsnano.6b02711 ↗
18. 10.1021/cm980163a10.1021/cm980163a ↗
19. 10.1021/nn500865d10.1021/nn500865d ↗
20. 10.1038/nmat171710.1038/nmat1717 ↗
21. 10.1002/adma.20100317810.1002/adma.201003178 ↗
22. 10.1063/1.306875410.1063/1.3068754 ↗
23. 10.1002/adma.20100317810.1002/adma.201003178 ↗
24. 10.1039/C6RA05668G10.1039/C6RA05668G ↗
25. 10.1002/adfm.20150085310.1002/adfm.201500853 ↗
26. 10.7567/JJAP.55.06GJ0910.7567/JJAP.55.06GJ09 ↗
27. 10.1002/adma.20150257410.1002/adma.201502574 ↗
28. 10.1021/nn101950n10.1021/nn101950n ↗
29. 10.1039/C6CP00823B10.1039/C6CP00823B ↗
30. 10.1038/srep2962410.1038/srep29624 ↗
31. Fujii T. · Phys. Rev. B · 2007 · 75 · 165101.110.1103/PhysRevB.75.165101 ↗
32. 10.1021/acs.nanolett.6b0178110.1021/acs.nanolett.6b01781 ↗
33. 10.1088/0957-4484/22/25/25401010.1088/0957-4484/22/25/254010 ↗
34. Kao K.-C. · 1981
35. 10.1039/c0jm01550d10.1039/c0jm01550d ↗
36. Waser R. · 2012
37. 10.1002/adma.20130602810.1002/adma.201306028 ↗
38. 10.1002/adma.20150267810.1002/adma.201502678 ↗
39. Kim, M. J.; Baek, I. G.; Ha, Y. H.; Baik, S. J.; Kim, J. H.; Seong, D. J.; Kim, S. J.; Kwon, Y. H.; Lim, C. R.; Park, H. K.; Gilmer, D.; Kirsch, P.; Jammy, R.; Shin, Y. G.; Choi, S.; Chung, C.InLow Power Operating Bipolar TMO ReRAM for Sub 10-nm Era. Proceedings of 2011 IEEE International Electron Devices Meeting;IEEE International, 2010; pp19.3.11–19.3.14.10.1109/IEDM.2010.5703391 ↗
40. 10.7567/JJAP.52.04CD0510.7567/JJAP.52.04CD05 ↗
41. 10.1126/science.120193810.1126/science.1201938 ↗
42. 10.1016/S1369-7021(08)70119-610.1016/S1369-7021(08)70119-6 ↗
43. Lelmini D. · 2015