journal article·2016-08-24Open access

Using Laser-Induced Thermal Voxels to Pattern Diverse Materials at the Solid–Liquid Interface

Lauren D. Zarzar, B. S. Swartzentruber, Brian F. Donovan, Patrick E. Hopkins, Bryan Kaehr

Abstract

We describe a high-resolution patterning approach that combines the spatial control inherent to laser direct writing with the versatility of benchtop chemical synthesis. By taking advantage of the steep thermal gradient that occurs while laser heating a metal edge in contact with solution, diverse materials comprising transition metals are patterned with feature size resolution nearing 1 μm. We demonstrate fabrication of reduced metallic nickel in one step and examine electrical properties and air stability through direct-write integration onto a device platform. This strategy expands the chemistries and materials that can be used in combination with laser direct writing.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Laser-Ablation Synthesis of Nanoparticles · Nonlinear Optical Materials Studies · Laser Material Processing Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States

Center for Integrated Nanotechnologies, Sandia National Laboratories, Albuquerque, New Mexico 87545, United States

Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22904, United States

Advanced Materials Laboratory, Sandia National Laboratories, Albuquerque, New Mexico 87185, United States

Department of Chemical and Biological Engineering, The University of New Mexico, Albuquerque, New Mexico 87131, United States

Funding

Basic Energy Sciences

References (32)

Show source-provided references
1. 10.1557/mrs2007.1110.1557/mrs2007.11 ↗
3. 10.1002/adma.20090114110.1002/adma.200901141 ↗
4. 10.1016/j.optlastec.2015.09.02210.1016/j.optlastec.2015.09.022 ↗
5. 10.1021/nn503383z10.1021/nn503383z ↗
6. 10.1088/0957-4484/18/34/34520210.1088/0957-4484/18/34/345202 ↗
7. 10.1021/am507327y10.1021/am507327y ↗
8. 10.1063/1.297758710.1063/1.2977587 ↗
9. 10.1021/acsnano.5b0112510.1021/acsnano.5b01125 ↗
10. 10.1016/0169-4332(90)90039-310.1016/0169-4332(90)90039-3 ↗
11. 10.1007/s00339-013-8109-110.1007/s00339-013-8109-1 ↗
12. 10.1063/1.364304210.1063/1.3643042 ↗
13. 10.1063/1.217763610.1063/1.2177636 ↗
14. 10.1364/OPEX.13.00127510.1364/OPEX.13.001275 ↗
15. 10.1021/ja211602t10.1021/ja211602t ↗
16. 10.1002/adfm.20120386310.1002/adfm.201203863 ↗
17. 10.1002/smll.20130159910.1002/smll.201301599 ↗
18. 10.1021/jp501642j10.1021/jp501642j ↗
19. 10.1016/j.pmatsci.2006.10.01610.1016/j.pmatsci.2006.10.016 ↗
20. 10.1016/S0169-4332(99)00455-910.1016/S0169-4332(99)00455-9 ↗
21. 10.1016/S0169-4332(02)00850-410.1016/S0169-4332(02)00850-4 ↗
22. 10.1070/RC2011v080n09ABEH00422410.1070/RC2011v080n09ABEH004224 ↗
23. Incropera F. · 1996
24. 10.1103/RevModPhys.61.60510.1103/RevModPhys.61.605 ↗
25. Kapitza P. · J. Phys.(USSR) · 1941 · 4 · 181
26. 10.1063/1.483261510.1063/1.4832615 ↗
27. 10.1002/smll.20080108410.1002/smll.200801084 ↗
28. 10.1016/0167-2738(89)90222-110.1016/0167-2738(89)90222-1 ↗
29. 10.1021/jp205281a10.1021/jp205281a ↗
30. 10.1002/adma.20150324410.1002/adma.201503244 ↗
31. 10.1021/cr300491e10.1021/cr300491e ↗
32. 10.1016/j.physb.2006.05.24810.1016/j.physb.2006.05.248 ↗