Field Emission Properties of Low-Temperature, Hydrothermally Grown Tungsten Oxide
Source abstract
Abstract
Tungsten oxide layers have been prepared on conductive glass substrates using aqueous chemical growth from a sodium tungstate precursor at low-temperature hydrothermal conditions. The deposits were then tested as cold electron emitters. Traceable layers could be deposited only within a narrow pH range of 1.5-2 at a time length not exceeding 4 h. Transmittance in the visible spectrum was found to decrease with deposition time. The presence of both monoclinic and hexagonal phases was always detected. At the longest deposition times and highest precursor concentrations, morphologies comprise randomly oriented spikes or rods. The overall emission performance is found to improve with growth time and precursor concentration. The role of morphology on the emission properties of the films is discussed.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Semiconductor materials and devices · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Electronic Structure and Laser, Foundation for Research & Technology−Hellas, Vassilika Vouton, 711 10 Heraklion, Crete, Greece
References (34)
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