Single-Step Process for the Deposition of High Water Contact Angle and High Water Sliding Angle Surfaces by Atmospheric Pressure Dielectric Barrier Discharge
Source abstract
Abstract
Fluorine-free surfaces with high water contact angle (WCA) and high adhesion force to water are prepared by the atmospheric pressure dielectric barrier discharge (AP-DBD) of hexamethyldisiloxane on cold rolled aluminum foil. Water droplets, which remained on the plasma-polymerized hexamethyldisiloxane (ppHMDSO) surface with contact angle of 155°, do not slide even when the surface is tilted vertically or turned upside down. Scanning electron microscopy, atomic force microscopy and confocal microscopy highlight the importance of the dual-scale roughness of the ppHMDSO surface. The "sticky" high WCA property is achieved only when the nanometer scale particles generated during the AP-DBD process are present at the surface of the film and combine to the micrometer scale rolling lines of the aluminum substrate.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Surface Modification and Superhydrophobicity · Plasma Applications and Diagnostics · Electrohydrodynamics and Fluid Dynamics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Science and Analysis of Materials Department, Centre de Recherche Public - Gabriel Lippmann, Belvaux, L-4422, Luxembourg
Innovation Centre, Eurofoil Innovation Centre, Eurofoil, Belvaux, L-4422, Luxembourg
References (43)
Show source-provided references
1. Jin M. · Adv. Mater. · 2005 · 17 · 197710.1002/adma.200401726 ↗
2. Cho W. K. · Adv. Funct. Mater. · 2008 · 18 · 108910.1002/adfm.200701454 ↗
3. Cassie A. B. D. · Trans. Faraday Soc. · 1944 · 40 · 54610.1039/tf9444000546 ↗
4. Wenzel R. N. · Ind. Eng. Chem. · 1936 · 28 · 98810.1021/ie50320a024 ↗
5. Saison T. · Bioinspir. Biomim. · 2008 · 3 · 04600410.1088/1748-3182/3/4/046004 ↗
6. Gao L. · Langmuir · 2006 · 22 · 296610.1021/la0532149 ↗
7. Feng L. · Langmuir · 2008 · 24 · 411410.1021/la703821h ↗
8. Balu B. · Lab Chip · 2009 · 9 · 306610.1039/b909868b ↗
9. Boscher N. D. · J. Mater. Chem. · 2006 · 16 · 12210.1039/B514440J ↗
10. Yao Y. · Macromol. Rapid Commun. · 2006 · 27 · 162710.1002/marc.200600415 ↗
11. Guo Z.-G. · Appl. Phys. Lett. · 2007 · 90 · 22311110.1063/1.2745251 ↗
12. Nicolas M. · J. Colloid Interface Sci. · 2010 · 343 · 60810.1016/j.jcis.2009.11.052 ↗
13. Zhao X. D. · Langmuir · 2011 · 27 · 322410.1021/la104709d ↗
14. Peng J. · J. Phys. Chem. C · 2010 · 114 · 592610.1021/jp909430z ↗
15. Zhang D. · ACS Appl. Mater. Interfaces · 2012 · 4 · 490510.1021/am3012388 ↗
16. Cho K.-H. · Nanotechnology · 2011 · 22 · 44570610.1088/0957-4484/22/44/445706 ↗
17. Kim D. S. · Microelectron. Eng. · 2009 · 86 · 137510.1016/j.mee.2009.02.017 ↗
18. Davies J. · Int. J. Adhes. Adhes. · 2009 · 29 · 38010.1016/j.ijadhadh.2008.07.009 ↗
19. Gao L. · J. Am. Soc. Chem. · 2006 · 128 · 905210.1021/ja062943n ↗
20. Khorasani M. T. · Appl. Surf. Sci. · 2005 · 242 · 33910.1016/j.apsusc.2004.08.035 ↗
21. Crick C. R. · J. Mater. Chem. · 2009 · 19 · 107410.1039/B820102C ↗
22. Nwankire C. E. · Plasma Process. Polym. · 2011 · 8 · 30510.1002/ppap.201000069 ↗
23. Ji Y.-Y. · Appl. Surf. Sci. · 2009 · 255 · 457510.1016/j.apsusc.2008.12.002 ↗
24. Kim M. C. · Surf. Coat. Technol. · 2009 · 204 · 42810.1016/j.surfcoat.2009.08.002 ↗
25. Boscher N. D. · Surf. Coat. Technol. · 2011 · 205 · 535010.1016/j.surfcoat.2011.05.043 ↗
26. Tendero C. · Spectrochim. Acta B · 2006 · 61 · 210.1016/j.sab.2005.10.003 ↗
27. Boscher N. D. · Plasma Process. Polym. · 2010 · 7 · 16310.1002/ppap.200900094 ↗
28. Boscher N. D. · Surf. Coat. Technol. · 2010 · 205 · 243810.1016/j.surfcoat.2010.09.037 ↗
29. Burkey D. D. · J. Electrochem. Soc. · 2001 · 151 · F10510.1149/1.1688801 ↗
30. Alexander M. R. · Appl. Surf. Sci. · 1999 · 137 · 17910.1016/S0169-4332(98)00479-6 ↗
31. O’Hare L. A. · Surf. Interface Anal. · 2007 · 39 · 92610.1002/sia.2634 ↗
32. Azioune A. · Surf. Interface Anal. · 2007 · 39 · 61510.1002/sia.2563 ↗
33. Hoefnagels H. F. · Langmuir · 2007 · 23 · 1315810.1021/la702174x ↗
34. Nishino T. · Langmuir · 1999 · 15 · 432110.1021/la981727s ↗
35. Lafuma A. · Nat. Mater. · 2003 · 2 · 45710.1038/nmat924 ↗
36. Callies M. · Soft Matter · 2005 · 1 · 5510.1039/b501657f ↗
37. Michael N. · Microelectron. Eng. · 2007 · 84 · 38210.1016/j.mee.2006.10.054 ↗
38. Trunec D. · J. Phys. D: Appl. Phys. · 2004 · 37 · 211210.1088/0022-3727/37/15/010 ↗
39. Borra J.-P. · J. Phys. D: Appl. Phys. · 2006 · 39 · R1910.1088/0022-3727/39/2/R01 ↗
40. Lee J. H. · J. Electrochem. Soc. · 2009 · 156 · D24810.1149/1.3129464 ↗
41. Jidenko N. · J. Phys. D: Appl. Phys. · 2007 · 49 · 415510.1088/0022-3727/40/14/009 ↗
42. Massines F. · Surf. Coat. Technol. · 2005 · 200 · 185510.1016/j.surfcoat.2005.08.010 ↗
43. Choi Y. H. · Thin Solid Film · 2006 · 506 · 38910.1016/j.tsf.2005.08.103 ↗