journal article·2019-06-12

Surface Structure Dependence of Mechanochemical Etching: Scanning Probe-Based Nanolithography Study on Si(100), Si(110), and Si(111)

Chen Xiao, Xiaojun Xin, Xin He, Hongbo Wang, Lei Chen, Seong H. Kim, Linmao Qian

ACS Applied Materials & Interfaces· Volume 11· Issue 23
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Abstract

We employed a scanning probe-based lithography process on single-crystalline Si(100), Si(110), and Si(111) surfaces and studied the effects of crystallographic surface structures on mechanochemical etching of silicon in liquid water. The facet angle and etching rate of the mechanochemical process were different from those of the purely chemical etching process. In liquid water, the shape of the mechanochemically etched nanochannel appeared to be governed by thermodynamics of the etched surface, rather than stress distribution. Analyzing the etch rate with the mechanically assisted Arrhenius-type kinetics model showed that the shear-induced hydrolysis activity varies drastically with the crystallographic structure of silicon surface.
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Research context

OpenAlex topics: Force Microscopy Techniques and Applications · Mechanical and Optical Resonators · Advanced Surface Polishing Techniques

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Affiliations

Tribology Research Institute, State Key Laboratory of Traction Power, Southwest Jiaotong University, Chengdu 610031, China

Department of Chemical Engineering and Materials Research Institute, Pennsylvania State University, University Park, Pennsylvania 16802, United States

Key Laboratory of Magnetic Levitation Technologies and Maglev Trains (Ministry of Education), Superconductivity and New Energy R&D Center, Mail stop 165#, Southwest Jiaotong University, Chengdu 610031, China

Funding

Southwest Jiaotong University · China Scholarship Council · Division of Civil, Mechanical and Manufacturing Innovation · National Natural Science Foundation of China · State Key Laboratory of Traction Power, Southwest Jiaotong University

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