journal article·2018-04-11

Fabrication of Uniform Wrinkled Silica Nanoparticles and Their Application to Abrasives in Chemical Mechanical Planarization

Jaehoon Ryu, Wookhwan Kim, Juyoung Yun, Kisu Lee, Jungsup Lee, Haejun Yu, Jae Hyun Kim, Jae Jeong Kim, Jyongsik Jang

ACS Applied Materials & Interfaces· Volume 10· Issue 14
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Abstract

A simple one-pot method is reported for the fabrication of uniform wrinkled silica nanoparticles (WSNs). Rapid cooling of reactants at the appropriate moment during synthesis allowed the separation of nucleation and growth stages, resulting in uniform particles. The factors affecting particle size and interwrinkle distance were also investigated. WSNs with particle sizes of 65–400 nm, interwrinkle distances of 10–33 nm, and surface areas up to 617 m2 g–1 were fabricated. Furthermore, our results demonstrate the advantages of WSNs over comparable nonporous silica nanospheres and fumed silica-based products as an abrasive material in chemical mechanical planarization processes.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Mesoporous Materials and Catalysis · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Foundry CMP Technology Team, Samsung Electronics, 1, Samsung-ro, Giheung-gu, Yongin-si, Gyeonggi-do 17113, Korea

Foundry Material Technology Group, Semiconductor Division Samsung Electronics, 1, Samsung-ro, Giheung-gu, Yongin-si, Gyeonggi-do 17113, Korea

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