Magnetic and Electrical Transport Properties of LaBaCo2O5.5+δ Thin Films on Vicinal (001) SrTiO3 Surfaces
Source abstract
Abstract
Highly epitaxial LaBaCo(2)O(5.5+δ) thin films were grown on the vicinal (001) SrTiO(3) substrates with miscut angles of 0.5°, 3.0°, and 5.0° to systemically study strain effect on its physical properties. The electronic transport properties and magnetic behaviors of these films are strongly dependent on the miscut angles. With increasing the miscut angle, the transport property of the film changes from semiconducting to semimetallic, which results most probably from the locally strained domains induced by the surface step terraces. In addition, a very large magnetoresistance (34% at 60 K) was achieved for the 0.5°-miscut film, which is ~30% larger than that for the film grown on the regular (001) SrTiO(3) substrates.
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Research context
OpenAlex topics: Magnetic and transport properties of perovskites and related materials · Advanced Condensed Matter Physics · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics and Astronomy, University of Texas at San Antonio, Texas 78249, United States
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, People’s Republic of China
Department of Chemistry, North Carolina State University, Raleigh, North Carolina 27695-8204, United States
References (34)
Show source-provided references
1. Senarisrodriguez M. A. · J. Solid State Chem. · 1995 · 118 · 32310.1006/jssc.1995.1351 ↗
2. Luo G. P. · Appl. Phys. Lett. · 2000 · 76 · 190810.1063/1.126208 ↗
3. Yang Y. L. · J. Electrochem. Soc. · 2000 · 147 · 400110.1149/1.1394010 ↗
4. Akahoshi D. · J. Solid State Chem. · 2001 · 156 · 35510.1006/jssc.2000.9006 ↗
5. Yang Y. M. L. · Appl. Phys. Lett. · 2001 · 79 · 77610.1063/1.1390316 ↗
6. Podlesnyak A. · Phys. Rev. Lett. · 2006 · 97 · 24720810.1103/PhysRevLett.97.247208 ↗
7. Kozlenko D. P. · Eur. Phys. J. B · 2009 · 70 · 32710.1140/epjb/e2009-00228-x ↗
8. Zhang Y. M. · Inorg. Chem. · 2011 · 50 · 1064310.1021/ic200963g ↗
9. Yuan Z. · Appl. Phys. Lett. · 2007 · 90 · 21211110.1063/1.2741407 ↗
10. Nakajima T. · J. Phys. Soc. Jpn. · 2005 · 74 · 157210.1143/JPSJ.74.1572 ↗
11. Rautama E. L. · Chem. Mater. · 2008 · 20 · 274210.1021/cm703314p ↗
12. Rautama E. L. · Chem. Mater. · 2009 · 21 · 10210.1021/cm8021775 ↗
13. He J. · Thin Solid Films · 2011 · 519 · 437110.1016/j.tsf.2011.02.015 ↗
14. Liu J. · Appl. Phys. Lett. · 2010 · 97 · 09410110.1063/1.3484964 ↗
15. Liu J. · Chem. Mater. · 2010 · 22 · 79910.1021/cm901479g ↗
16. Liu M. · Appl. Phys. Lett. · 2010 · 96 · 13210610.1063/1.3378877 ↗
17. Liu M. · ACS Appl. Mater. Interfaces · 2012 · 4 · 552410.1021/am301427c ↗
18. Ma C. R. · Appl. Phys. Lett. · 2012 · 101 · 02160210.1063/1.4734386 ↗
19. Chen C. L. · Appl. Phys. Lett. · 2001 · 78 · 65210.1063/1.1343499 ↗
20. Jiang J. C. · J. Appl. Phys. · 2002 · 91 · 318810.1063/1.1446221 ↗
21. Lin Y. · Appl. Phys. Lett. · 2004 · 84 · 57710.1063/1.1643546 ↗
22. Liu S. W. · Appl. Phys. Lett. · 2004 · 85 · 320210.1063/1.1801176 ↗
23. Huang D. X. · J. Appl. Phys. · 2005 · 97 · 04350610.1063/1.1845576 ↗
24. Lu H. L. · ACS Appl. Mater. Interfaces · 2010 · 2 · 249610.1021/am100542n ↗
25. Chen C. L. · Appl. Phys. Lett. · 1997 · 71 · 104710.1063/1.119723 ↗
26. Canadell E. · Inorg. Chem. · 1990 · 29 · 139810.1021/ic00332a023 ↗
27. Gourdon O. · J. Solid State Chem. · 2001 · 162 · 10310.1006/jssc.2001.9361 ↗
28. Kundu A. K. · Phys. Rev. B · 2007 · 76 · 18443210.1103/PhysRevB.76.184432 ↗
29. Kundu A. K. · J. Phys.: Condens. Matter · 2009 · 21 · 056007
30. Taskin A. A. · Phys. Rev. B · 2005 · 71 · 13441410.1103/PhysRevB.71.134414 ↗
31. Taskin A. A. · Phys. Rev. B · 2006 · 73 · 12110110.1103/PhysRevB.73.121101 ↗
32. Chen C. L. · Phys. Rev. Lett. · 1990 · 64 · 314710.1103/PhysRevLett.64.3147 ↗
33. Chen C. L. · Phys. Rev. B · 1990 · 41 · 1240310.1103/PhysRevB.41.12403 ↗
34. Rao R. A. · Appl. Phys. Lett. · 1997 · 71 · 117110.1063/1.119616 ↗