journal article·2014-12-10

Plasma Jet Printing of Electronic Materials on Flexible and Nonconformal Objects

Ram P. Gandhiraman, Vivek Jayan, Jin-Woo Han, Bin Chen, Jessica E. Koehne, M. Meyyappan

Publisher page

Abstract

We present a novel approach for the room-temperature fabrication of conductive traces and their subsequent site-selective dielectric encapsulation for use in flexible electronics. We have developed an aerosol-assisted atmospheric pressure plasma-based deposition process for efficiently depositing materials on flexible substrates. Silver nanowire conductive traces and silicon dioxide dielectric coatings for encapsulation were deposited using this approach as a demonstration. The paper substrate with silver nanowires exhibited a very low change in resistance upon 50 cycles of systematic deformation, exhibiting high mechanical flexibility. The applicability of this process to print conductive traces on nonconformal 3D objects was also demonstrated through deposition on a 3D-printed thermoplastic object, indicating the potential to combine plasma printing with 3D printing technology. The role of plasma here includes activation of the material present in the aerosol for deposition, increasing the deposition rate, and plasma polymerization in the case of inorganic coatings. The demonstration here establishes a low-cost, high-throughput, and facile process for printing electronic components on nonconventional platforms.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanomaterials and Printing Technologies · Electrohydrodynamics and Fluid Dynamics · Surface Modification and Superhydrophobicity

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

NASA Ames Research Center, Moffett Field, California 94035, United States

References (41)

Show source-provided references
1. Secor E. B. · J. Phys. Chem. Lett. · 2013 · 4 · 134710.1021/jz400644c ↗
2. Han J. W. · RSC Adv. · 2014 · 54910.1039/C3RA46347H ↗
3. Huang J. · ACS Nano · 2013 · 7 · 210610.1021/nn304407r ↗
4. Han J. W. · Appl. Phys. Lett. · 2013 · 102 · 19310410.1063/1.4805025 ↗
5. Sirringhaus H. · Science · 2000 · 290 · 212310.1126/science.290.5499.2123 ↗
6. Wang S. · Nano Lett. · 2009 · 10 · 92
7. Hu L. · Proc. Natl. Acad. Sci. U.S.A. · 2009 · 106 · 2149010.1073/pnas.0908858106 ↗
8. Lee H. M. · Langmuir · 2012 · 28 · 1312710.1021/la302479x ↗
9. Shim B. S. · Nano Lett. · 2008 · 8 · 415110.1021/nl801495p ↗
10. Kholmanov I. N. · Nano Lett. · 2012 · 12 · 567910.1021/nl302870x ↗
11. Fan Z. Y. · Nano Lett. · 2008 · 8 · 2010.1021/nl071626r ↗
12. Takahashi T. · J. Am. Chem. Soc. · 2009 · 131 · 210210.1021/ja8099954 ↗
13. Siegel A. C. · Adv. Funct. Mater. · 2010 · 20 · 2810.1002/adfm.200901363 ↗
14. Anto B. T. · Adv. Funct. Mater. · 2010 · 20 · 29610.1002/adfm.200901336 ↗
15. Van Osch T. H. J. · Adv. Mater. · 2008 · 20 · 34310.1002/adma.200701876 ↗
16. Magdassi S. · ACS Nano · 2010 · 4 · 194310.1021/nn901868t ↗
17. Kim D. · Adv. Mater. · 2008 · 20 · 308410.1002/adma.200702750 ↗
18. Polavarapu L. · Chem. Mater. · 2011 · 23 · 327310.1021/cm200471s ↗
19. Park J. U. · Nat. Mater. · 2007 · 6 · 78210.1038/nmat1974 ↗
20. Sekitani T. · Nat. Mater. · 2010 · 9 · 101510.1038/nmat2896 ↗
21. Netzer N. L. · Chem. Commun. · 2011 · 47 · 960610.1039/c1cc13641k ↗
22. Sun Y. G. · Nano Lett. · 2002 · 2 · 16510.1021/nl010093y ↗
23. Heimann R. B. · 2008
24. Moravej M. · J. Appl. Phys. · 2004 · 96 · 701110.1063/1.1815047 ↗
25. Borra J. P. · Plasma Phys. Controlled Fusion · 2008 · 50 · 12403610.1088/0741-3335/50/12/124036 ↗
26. Jidenko N. · J. Phys. D: Appl. Phys. · 2007 · 40 · 415510.1088/0022-3727/40/14/009 ↗
27. Kurth D. G. · Langmuir · 1906 · 11 · 306110.1021/la00008a035 ↗
28. Aumaille K. · Thin Solid Films · 2000 · 359 · 18810.1016/S0040-6090(99)00883-4 ↗
29. Socrates G. · 2004
30. Kirk C. T. · Phys. Rev. B · 1988 · 38 · 125510.1103/PhysRevB.38.1255 ↗
31. Förch R. · Chem. Vap. Deposition · 2007 · 13 · 28010.1002/cvde.200604035 ↗
32. Bensch W. · Semicond. Sci. Technol. · 1990 · 5 · 42110.1088/0268-1242/5/5/008 ↗
33. Kim H. J. · Surf. Coat. Technol. · 2003 · 171 · 3910.1016/S0257-8972(03)00233-0 ↗
34. Babayan S. E. · Plasma Sources Sci. Technol. · 2001 · 10 · 57310.1088/0963-0252/10/4/305 ↗
35. Manickam G. · Analyst · 2012 · 137 · 526510.1039/c2an35826c ↗
36. Thomann I. · Nano Lett. · 2011 · 11 · 344010.1021/nl201908s ↗
37. Schuller J. A. · Nat. Mater. · 2010 · 9 · 19310.1038/nmat2630 ↗
38. Kim S.-S. · Appl. Phys. Lett. · 2008 · 93 · 07330710.1063/1.2967471 ↗
39. Garnett E. C. · Nat. Mater. · 2012 · 11 · 24110.1038/nmat3238 ↗
40. Cho J. H. · Nat. Mater. · 2008 · 7 · 90010.1038/nmat2291 ↗
41. Kim S. H. · ACS Appl. Mater. Interfaces · 2013 · 5 · 658010.1021/am401200y ↗