Effect of Electronegativity on Bipolar Resistive Switching in a WO3-Based Asymmetric Capacitor Structure
Source abstract
Abstract
This study investigates the transport and switching time of nonvolatile tungsten oxide based resistive-switching (RS) memory devices. These devices consist of a highly resistive tungsten oxide film sandwiched between metal electrodes, and their RS characteristics are bipolar in the counterclockwise direction. The switching voltage, retention, endurance, and switching time are strongly dependent on the type of electrodes used, and we also find quantitative and qualitative evidence that the electronegativity (χ) of the electrodes plays a key role in determining the RS properties and switching time. We also propose an RS model based on the role of the electronegativity at the interface.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Division of Physics and Semiconductor Science, Dongguk University, Seoul 100-715, Korea
Funding
National Research Foundation of Korea
References (40)
Show source-provided references
1. 10.1038/nmat202310.1038/nmat2023 ↗
2. 10.1002/adma.20090037510.1002/adma.200900375 ↗
3. 10.1016/S1369-7021(11)70302-910.1016/S1369-7021(11)70302-9 ↗
4. 10.1021/am504004v10.1021/am504004v ↗
5. 10.1038/srep0735410.1038/srep07354 ↗
6. 10.1021/nl201074a10.1021/nl201074a ↗
7. 10.1021/am404875s10.1021/am404875s ↗
8. 10.1021/nl904290610.1021/nl9042906 ↗
9. 10.1063/1.243766810.1063/1.2437668 ↗
10. 10.7567/JJAP.51.10410210.7567/JJAP.51.104102 ↗
11. 10.1143/APEX.3.09110110.1143/APEX.3.091101 ↗
12. 10.1063/1.303289610.1063/1.3032896 ↗
13. 10.1002/adfm.20100125410.1002/adfm.201001254 ↗
14. 10.1007/s00339-011-6271-x10.1007/s00339-011-6271-x ↗
15. 10.1063/1.367619410.1063/1.3676194 ↗
16. 10.1143/JJAP.49.04DD1710.1143/JJAP.49.04DD17 ↗
17. 10.1063/1.330063710.1063/1.3300637 ↗
18. 10.1016/j.jallcom.2013.05.03010.1016/j.jallcom.2013.05.030 ↗
19. 10.1021/am504439910.1021/am5044399 ↗
20. 10.1063/1.311499310.1063/1.3114993 ↗
21. 10.1016/j.mseb.2010.12.01010.1016/j.mseb.2010.12.010 ↗
22. 10.1209/0295-5075/98/2700710.1209/0295-5075/98/27007 ↗
23. 10.1021/nl500749q10.1021/nl500749q ↗
24. 10.1063/1.329901110.1063/1.3299011 ↗
25. 10.1088/1674-1056/23/10/10730610.1088/1674-1056/23/10/107306 ↗
26. 10.1063/1.236108710.1063/1.2361087 ↗
27. 10.1063/1.486763910.1063/1.4867639 ↗
28. 10.1088/0957-4484/25/42/42520410.1088/0957-4484/25/42/425204 ↗
29. 10.1002/adfm.20110236210.1002/adfm.201102362 ↗
30. 10.1063/1.473060110.1063/1.4730601 ↗
31. 10.1149/2.004205ssl10.1149/2.004205ssl ↗
32. 10.1016/j.tsf.2015.05.00210.1016/j.tsf.2015.05.002 ↗
33. 10.1088/0957-4484/24/3/03570210.1088/0957-4484/24/3/035702 ↗
34. 10.1088/0022-3727/45/37/37530310.1088/0022-3727/45/37/375303 ↗
35. Sze, S. M.Physics of Semiconductor Devices,2nd ed;Wiley:New York, 1981; p403.
36. 10.1103/PhysRevB.73.24542710.1103/PhysRevB.73.245427 ↗
37. 10.1143/JJAP.49.11110110.1143/JJAP.49.111101 ↗
38. 10.1002/adma.20100018610.1002/adma.201000186 ↗
39. 10.1038/srep0405810.1038/srep04058 ↗
40. 10.1143/APEX.1.05500210.1143/APEX.1.055002 ↗