Full-Inorganic Flexible Ag2S Memristor with Interface Resistance–Switching for Energy-Efficient Computing
Source abstract
Abstract
Flexible memristor-based neural network hardware is capable of implementing parallel computation within the memory units, thus holding great promise for fast and energy-efficient neuromorphic computing in flexible electronics. However, the current flexible memristor (FM) is mostly operated with a filamentary mechanism, which demands large energy consumption in both setting and computing. Herein, we report an Ag2S-based FM working with distinct interface resistance–switching (RS) mechanism. In direct contrast to conventional filamentary memristors, RS in this Ag2S device is facilitated by the space charge-induced Schottky barrier modification at the Ag/Ag2S interface, which can be achieved with the setting voltage below the threshold voltage required for filament formation. The memristor based on interface RS exhibits 105 endurance cycles and 104 s retention under bending condition, and multiple level conductive states with exceptional tunability and stability. Since interface RS does not require the formation of a continuous Ag filament via Ag+ ion reduction, it can achieve an ultralow switching energy of ∼0.2 fJ. Furthermore, a hardware-based image processing with a software-comparable computing accuracy is demonstrated using the flexible Ag2S memristor array. And the image processing with interface RS indeed consumes 2 orders of magnitude lower power than that with filamentary RS on the same hardware. This study demonstrates a new resistance–switching mechanism for energy-efficient flexible neural network hardware.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Neuroscience and Neural Engineering
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Division of Solid-State Electronics, Department of Electrical Engineering, Uppsala University, Uppsala 75121, Sweden
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
Funding
Shanghai Municipal People's Government · National Natural Science Foundation of China
References (34)
Show source-provided references
1. 10.1109/CVPR.2016.9010.1109/CVPR.2016.90 ↗
2. Ren S. · 2015 · 28
3. 10.1038/nature1453910.1038/nature14539 ↗
4. 10.1038/nnano.2015.2910.1038/nnano.2015.29 ↗
5. 10.1038/s41928-018-0092-210.1038/s41928-018-0092-2 ↗
6. 10.1109/TCT.1971.108333710.1109/TCT.1971.1083337 ↗
7. 10.1039/C3NR05682A10.1039/C3NR05682A ↗
8. 10.1038/s41928-018-0023-210.1038/s41928-018-0023-2 ↗
9. 10.1038/s41586-020-1942-410.1038/s41586-020-1942-4 ↗
10. 10.1002/adma.20170540010.1002/adma.201705400 ↗
11. 10.1002/adma.20210006610.1002/adma.202100066 ↗
12. 10.1021/acs.nanolett.9b0527110.1021/acs.nanolett.9b05271 ↗
13. 10.1021/acsami.9b0444310.1021/acsami.9b04443 ↗
14. 10.1039/C4TC00652F10.1039/C4TC00652F ↗
15. 10.1002/smll.20180543110.1002/smll.201805431 ↗
16. 10.1038/s41565-020-0694-510.1038/s41565-020-0694-5 ↗
17. 10.1109/LED.2021.312748910.1109/LED.2021.3127489 ↗
18. 10.1021/acs.nanolett.8b0402310.1021/acs.nanolett.8b04023 ↗
19. 10.1038/s41563-018-0047-z10.1038/s41563-018-0047-z ↗
20. 10.1039/C9EE01777A10.1039/C9EE01777A ↗
21. 10.1021/acsami.2c0226410.1021/acsami.2c02264 ↗
22. 10.1038/s41467-018-05248-810.1038/s41467-018-05248-8 ↗
23. 10.1021/nn100483a10.1021/nn100483a ↗
24. 10.1016/0038-1101(73)90132-910.1016/0038-1101(73)90132-9 ↗
25. 10.1063/1.32294210.1063/1.322942 ↗
26. 10.1002/adfm.20170472510.1002/adfm.201704725 ↗
27. 10.1063/1.165989510.1063/1.1659895 ↗
28. 10.1088/0957-4484/19/16/16520310.1088/0957-4484/19/16/165203 ↗
29. 10.1002/adma.20210337610.1002/adma.202103376 ↗
30. 10.1002/adfm.20210109910.1002/adfm.202101099 ↗
31. 10.1038/nmat485610.1038/nmat4856 ↗
32. 10.2147/IJN.S26753610.2147/IJN.S267536 ↗
33. 10.1039/C9NH00341J10.1039/C9NH00341J ↗
34. 10.1126/sciadv.150132610.1126/sciadv.1501326 ↗