journal article·2016-04-06

Thermally Stable Siloxane Hybrid Matrix with Low Dielectric Loss for Copper-Clad Laminates for High-Frequency Applications

Yong Ho Kim, Young-Woo Lim, Yun Hyeok Kim, Byeong-Soo Bae

Publisher page

Abstract

We report vinyl-phenyl siloxane hybrid material (VPH) that can be used as a matrix for copper-clad laminates (CCLs) for high-frequency applications. The CCLs, with a VPH matrix fabricated via radical polymerization of resin blend consisting of sol-gel-derived linear vinyl oligosiloxane and bulky siloxane monomer, phenyltris(trimethylsiloxy)silane, achieve low dielectric constant (Dk) and dissipation factor (Df). The CCLs with the VPH matrix exhibit excellent dielectric performance (Dk = 2.75, Df = 0.0015 at 1 GHz) with stability in wide frequency range (1 MHz to 10 GHz) and at high temperature (up to 275 °C). Also, the VPH shows good flame resistance without any additives. These results suggest the potential of the VPH for use in high-speed IC boards.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Silicone and Siloxane Chemistry · Synthesis and properties of polymers · Flame retardant materials and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Optical Materials and Coating (LOMC) Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea

Funding

National Research Foundation of Korea · Korea Evaluation Institute of Industrial Technology · KOLON Industries, Inc.

References (27)

Show source-provided references
1. 10.1016/j.ijheh.2006.02.00110.1016/j.ijheh.2006.02.001 ↗
2. 10.1002/app.3374510.1002/app.33745 ↗
3. 10.1007/s10965-010-9551-910.1007/s10965-010-9551-9 ↗
4. 10.1002/app.2532510.1002/app.25325 ↗
5. 10.1002/pi.147310.1002/pi.1473 ↗
6. 10.1016/S0266-3538(02)00046-510.1016/S0266-3538(02)00046-5 ↗
7. 10.1002/app.2139910.1002/app.21399 ↗
8. 10.1109/TEPM.2005.84683110.1109/TEPM.2005.846831 ↗
9. 10.1021/bk-1995-0614.ch03210.1021/bk-1995-0614.ch032 ↗
10. 10.1002/app.1187410.1002/app.11874 ↗
11. Datong Z. · Thermosetting Resin · 2000 · 15 · 1
12. 10.1039/C5RA18073B10.1039/C5RA18073B ↗
13. 10.1177/004051751454875010.1177/0040517514548750 ↗
14. 10.1002/pol.1977.17015100910.1002/pol.1977.170151009 ↗
15. 10.1002/app.1978.07022080710.1002/app.1978.070220807 ↗
16. 10.1063/1.219647510.1063/1.2196475 ↗
17. 10.1039/c3ra41478g10.1039/c3ra41478g ↗
18. Ahmad Z. · 2012 · 3
19. Debye P. J. W. · J. Soc. Chem. Ind. · 1929 · 48 · 103610.1002/jctb.5000484320 ↗
20. 10.1002/app.1196910.1002/app.11969 ↗
21. 10.1021/ja036094510.1021/ja0360945 ↗
22. 10.1021/ja208013610.1021/ja2080136 ↗
23. 10.1002/pat.80410.1002/pat.804 ↗
24. 10.1007/s11664-003-0213-010.1007/s11664-003-0213-0 ↗
25. Yu X. · 2010 · 228
26. 10.1016/j.progpolymsci.2013.06.00610.1016/j.progpolymsci.2013.06.006 ↗
27. 10.1038/3508413010.1038/35084130 ↗