journal article·2015-06-24Open access

Ambient Facile Synthesis of Gram-Scale Copper Selenide Nanostructures from Commercial Copper and Selenium Powder

Xin Qi Chen, Zhen Li, Shi Xue Dou

Abstract

Grams of copper selenides (Cu(2-x)Se) were prepared from commercial copper and selenium powders in the presence of thiol ligands by a one-pot reaction at room temperature. The resultant copper selenides are a mixture of nanoparticles and their assembled nanosheets, and the thickness of nanosheets assembled is strongly dependent on the ratio of thiol ligand to selenium powder. The resultant Cu(2-x)Se nanostructures were treated with hydrazine solution to remove the surface ligands and then explored as a potential thermoelectric candidate in comparison with commercial copper selenide powders. The research provides a novel ambient approach for preparation of Cu(2-x)Se nanocrystallines on a large scale for various applications.
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Research context

OpenAlex topics: Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films · Advanced Thermoelectric Materials and Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Nanoscience and Nanotechnology, Department of Physics, Central China Normal University, Wuhan 430079, China

Institute for Superconducting and Electronic Materials, Squires Way, Innovation Campus of the University of Wollongong, Wollongong, NSW 2500, Australia

School of Radiation Medicine and Radiation Protection, Collaborative Innovation Center of Radiation Medicine of Jiangsu Higher Education Institutions, Soochow University, 199 Ren Ai Road, Suzhou Industrial Park, Suzhou 215123, China

Funding

Australian Research Council · China Scholarship Council · Baosteel-Australia Joint Research and Development Centre

References (59)

Show source-provided references
1. Zhao Y. X. · Energy Environ. Sci. · 2012 · 5 · 556410.1039/C1EE02734D ↗
2. Riha S. C. · J. Am. Chem. Soc. · 2011 · 133 · 138310.1021/ja106254h ↗
3. Kriegel I. · J. Am. Chem. Soc. · 2012 · 134 · 158310.1021/ja207798q ↗
4. Kriegel I. · ACS Nano · 2013 · 7 · 436710.1021/nn400894d ↗
5. Xue M. Z. · J. Electrochem. Soc. · 2006 · 153 · A226210.1149/1.2358854 ↗
6. Yue J. L. · Chem. Commun. · 2013 · 49 · 586810.1039/c3cc41934g ↗
7. Liu S. L. · J. Phys. Chem. C · 2013 · 117 · 1516410.1021/jp4044122 ↗
8. Bo F. · J. Mater. Chem. A · 2014 · 2 · 1458510.1039/C4TA02545H ↗
9. Choi H. M. · ACS Appl. Mater. Interfaces · 2014 · 6 · 2333
10. Hessel C. M. · Nano Lett. · 2011 · 11 · 256010.1021/nl201400z ↗
11. Han C. · Chin. Sci. Bull. · 2014 · 59 · 207310.1007/s11434-014-0237-2 ↗
12. Yu B. · Nano Energy · 2012 · 1 · 47210.1016/j.nanoen.2012.02.010 ↗
13. Amiri O. · Mater. Sci. Semicond. Process. · 2013 · 16 · 148510.1016/j.mssp.2013.04.026 ↗
14. Amiri O. · Comb. Chem. High Throughput Screening · 2014 · 17 · 18310.2174/1386207311301010001 ↗
15. Amiri O. · Electrochim. Acta · 2015 · 152 · 10110.1016/j.electacta.2014.11.105 ↗
16. Amiri O. · Electrochim. Acta · 2015 · 153 · 9010.1016/j.electacta.2014.11.195 ↗
17. Amiri O. · RSC Adv. · 2014 · 4 · 6235610.1039/C4RA10316E ↗
18. Liu H. L. · Nat. Mater. · 2012 · 11 · 42210.1038/nmat3273 ↗
19. Zhao L. L. · Sci. Rep. · 2015 · 5 · 7671(1–6)
20. Zhang Y. · J. Phys. Chem. C · 2010 · 114 · 1484910.1021/jp105592d ↗
21. Li D. P. · CrystEngComm · 2010 · 12 · 185610.1039/b919087m ↗
22. Deka S. · J. Am. Chem. Soc. · 2010 · 132 · 891210.1021/ja103223x ↗
23. Hsiang H. I. · Mater. Res. Bull. · 2013 · 48 · 71510.1016/j.materresbull.2012.11.020 ↗
24. Filippo E. · J. Alloys Compd. · 2012 · 538 · 810.1016/j.jallcom.2012.05.111 ↗
25. Mi L. W. · Thin Solid Films · 2013 · 534 · 2210.1016/j.tsf.2013.01.005 ↗
26. Su H. L. · Mater. Res. Bull. · 2000 · 35 · 112910.1016/S0025-5408(00)00305-6 ↗
27. Kumar P. · J. Cryst. Growth · 2010 · 312 · 280410.1016/j.jcrysgro.2010.06.014 ↗
28. Liu Y. F. · J. Cryst. Growth · 2004 · 261 · 50810.1016/j.jcrysgro.2003.08.079 ↗
29. Han Z. H. · Mater. Lett. · 2000 · 44 · 36610.1016/S0167-577X(00)00060-4 ↗
30. Liu Y. F. · Mater. Res. Bull. · 2002 · 37 · 250910.1016/S0025-5408(01)00808-X ↗
31. Xie Y. · Inorg. Chem. · 2002 · 41 · 38710.1021/ic010108v ↗
32. Xu S. · J. Cryst. Growth · 2002 · 234 · 26310.1016/S0022-0248(01)01667-0 ↗
33. Thouin L. · Electrochim. Acta · 1993 · 38 · 238710.1016/0013-4686(93)85107-A ↗
34. Massaccesi S. · J. Electrochem. Soc. · 1993 · 140 · 254010.1149/1.2220858 ↗
35. Yu R. · J. Phys. Chem. C · 2009 · 113 · 1083310.1021/jp9025267 ↗
36. Cao X. B. · J. Phys. Chem. C · 2007 · 111 · 665810.1021/jp0702301 ↗
37. Li H. B. · Nano Lett. · 2011 · 11 · 496410.1021/nl202927a ↗
38. Jiang Y. · J. Solid State Chem. · 2002 · 167 · 2810.1006/jssc.2002.9610 ↗
39. Han C. · J. Am. Chem. Soc. · 2014 · 136 · 1762610.1021/ja510433j ↗
40. Cho A. · Thin Solid Films · 2013 · 546 · 29910.1016/j.tsf.2013.02.037 ↗
41. Witte W. · Thin Solid Films · 2008 · 517 · 86710.1016/j.tsf.2008.07.011 ↗
42. Izquierdo-Roca V. · Phys. Status Solidi A · 2009 · 206 · 100110.1002/pssa.200881239 ↗
43. Szafranski C. A. · Langmuir · 1998 · 14 · 357010.1021/la9702502 ↗
44. Miszta K. · J. Am. Chem. Soc. · 2014 · 136 · 906110.1021/ja5032634 ↗
45. Chang Y. · Langmuir · 2005 · 21 · 374610.1021/la050220w ↗
46. Xiong J. Y. · ACS Appl. Mater. Interfaces · 2014 · 6 · 1571610.1021/am502516s ↗
47. Han C. · J. Mater. Chem. A · 2014 · 2 · 1168310.1039/C4TA01579G ↗
48. Fonder G. · Electrochim. Acta · 2010 · 55 · 155710.1016/j.electacta.2009.10.023 ↗
49. Kumar P. · Inorg. Chem. · 2012 · 51 · 794510.1021/ic301422x ↗
50. Amaratunga W. · Can. J. Chem. · 1994 · 72 · 250610.1139/v94-317 ↗
51. Afsar H. · Analyst · 1989 · 114 · 131510.1039/AN9891401315 ↗
52. Afsar H. · Analyst · 1989 · 114 · 131910.1039/AN9891401319 ↗
53. Salavati-Niasari M. · J. Cluster Sci. · 2013 · 24 · 34910.1007/s10876-012-0520-9 ↗
54. Chen X. Q. · Chem.—Eur. J. · 2015 · 21 · 105510.1002/chem.201405354 ↗
55. Tan M. · J. Electrochem. Soc. · 2012 · 159 · K1510.1149/2.034201jes ↗
56. Chen X. Q. · J. Colloid Interface Sci. · 2014 · 442 · 14010.1016/j.jcis.2014.11.052 ↗
57. Xiao X. X. · Chin. Phys. B · 2011 · 20 · 0872019(1–8)
58. Ge Z. H. · J. Mater. Res. · 2011 · 26 · 271110.1557/jmr.2011.273 ↗
59. Liu W. S. · J. Appl. Phys. · 2007 · 102 · 10371710.1063/1.2815671 ↗