Fabrication, Characterization, and Application of a Composite Adsorbent for Simultaneous Removal of Arsenic and Fluoride
Source abstract
Abstract
Coexisting arsenic (As) and fluoride (F) in groundwater poses severe health risks worldwide. Highly efficient simultaneous removal of As and F is therefore of great urgency and high priority. The purpose of this study was to fabricate a novel composite adsorbent and explore the mechanism for concurrent removal of As(V) and F at the molecular level. This bifunctional adsorbent with titanium and lanthanum oxides impregnated on granular activated carbon (TLAC) exhibits a pronounced As(V) and F adsorption capacity over commercially available iron- and aluminum-based adsorbents for synthetic and real contaminated groundwater samples. Synchrotron-based X-ray microfluorescence analysis demonstrates that La and Ti were homogeneously distributed on TLAC. Extended X-ray absorption fine structure spectroscopic results suggest that As(V) formed bidentate binuclear surface complex as evidenced by an averaged Ti-As bond distance of 3.34 Å in the presence of F. Adsorption tests and Fourier transform infrared spectroscopy analysis indicate that F was selectively adsorbed on lanthanum oxides. The surface configurations constrained with the spectroscopic results were formulated in the charge distribution multisite complexation model to describe the competitive adsorption behaviors of As(V) and F. The results of this study indicate that TLAC could be used as an effective adsorbent for simultaneous removal of As(V) and F.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Arsenic contamination and mitigation · Fluoride Effects and Removal · Heavy Metal Exposure and Toxicity
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Environmental Chemistry and Ecotoxicology, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing 100085, China
Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201214, China
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