journal article·2004-02-01

Investigation of Transversal Conductance in Semiconductor CdTe Nanowires with and without a Coaxial Silica Shell

Xiaorong Liang, Susheng Tan, Zhiyong Tang, Nicholas A. Kotov

Langmuir· Volume 20· Issue 4
Publisher page

Abstract

Semiconductor CdTe nanowires were coated with a coaxial layer of silica in aqueous solutions by the hydrolysis of tetraethyl orthosilicate. The structure and morphology of the nanowires before and after coating were studied by UV−vis spectroscopy, atomic force microscopy, and transmission electron microscopy. Interestingly, silica deposition on the nanowire ends was retarded. For sufficiently thin layers, this effect makes possible the preparation of coaxial insulated nanowires with electrical access to the semiconductor core. Insulating properties of the silica layer were tested by applying voltage to a conductive AFM tip placed directly on the sidewall surface of the nanowires. These experiments demonstrated that the silica layers had strong insulating properties for coatings as thin as 10 nm. Similar measurements done with naked nanowires showed that transversal conductance took place through the middle band-gap states.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanowire Synthesis and Applications · Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Chemistry Department, Oklahoma State University, Stillwater, Oklahoma 74078, and Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48198

References (27)

Show source-provided references
1. Hu J. T. · Acc. Chem. Res. · 1999 · 32 · 445
2. Gudiksen M. S. · Nature · 2002 · 415 · 62010.1038/415617a ↗
3. Dai H. · Surf. Sci. · 2002 · 500 · 241
4. Wu, Y.; Yan, H.; Huang, M.; Messer, B.; Song, J. H.; Yang, P.Chem. Eur. J.2002,8, 1260−1268.10.1002/1521-3765(20020315)8:6<1260::AID-CHEM1260>3.0.CO;2-Q ↗
5. Xia Y. · Adv. Mater. · 2003 · 15 · 389
6. Wang D. · Adv. Mater. · 2002 · 14 · 91210.1002/1521-4095(20020618)14:12<912::AID-ADMA912>3.0.CO;2-L ↗
7. Correa-Duarte M. A. · J. Nanosci. Nanotechnol. · 2001 · 1 · 99
8. Ung T. · J. Phys. Chem. B · 1999 · 103 · 6773
9. Dimaria D. · J. Solid-State Electron. · 1997 · 41 · 96510.1016/S0038-1101(97)00006-3 ↗
10. Morales A. M. · Science · 1998 · 279 · 21110.1126/science.279.5348.208 ↗
11. Meng G. W. · J. Mater. Res. · 1998 · 13 · 253310.1557/JMR.1998.0353 ↗
12. Yin Y. · Nano Lett. · 2002 · 2 · 430
13. Kovtyukhova N. I. · Adv. Mater. · 2003 · 15 · 78510.1002/adma.200304701 ↗
14. Xie Y. · Adv. Mater. · 1999 · 11 · 151510.1002/(SICI)1521-4095(199912)11:18<1515::AID-ADMA1515>3.0.CO;2-A ↗
15. Obare S. O. · J. Nano Lett. · 2001 · 1 · 60310.1021/nl0156134 ↗
16. Tang Z. · Science · 2002 · 297 · 24010.1126/science.1071527 ↗
17. Stoeber W. · J. Colloid Interface Sci. · 1968 · 26 · 69
18. Ung T. · Langmuir · 1998 · 14 · 3748
19. Wang Y. · 2004
20. Ara M. · Appl. Phys. Lett. · 2002 · 80 · 2567
21. Kobayashi K. · Appl. Phys. Lett. · 2002 · 81 · 263110.1063/1.1510582 ↗
22. Oh J. · J. Appl. Phys. · 2002 · 92 · 3331
23. Nagumo T. · Jpn. J. Appl. Phys., Part 1 · 2003 · 42 · 1992
24. Zhao J. · Nanotechnology · 2003 · 14 · 504
25. Landman U. · Phys. Rev. Lett. · 2000 · 85 · 196110.1103/PhysRevLett.85.1958 ↗
26. Ishii K. · J. Vac. Sci. Technol., B · 1997 · 15 · 54710.1116/1.589289 ↗
27. Olbrich A. · Appl. Phys. Lett. · 1998 · 73 · 311610.1063/1.122690 ↗