journal article·2025-08-12Open access

Real-Time and Non-Destructive Detection of Interface Trap Density Using Second Harmonic Generation with a Physics-Informed Neural Network

Hua-Hsing Liu, Ting-Yu Yen, Yu-Hsuan Kuo, Yu-Jie Tsai, Bo-Yu Chen, Kuan-Ming Hung, Kuang Yao Lo

ACS Applied Electronic Materials· Volume 7· Issue 15

Abstract

High Resolution Image Download MS PowerPoint Slide The interface trap density (Dit) is a critical factor influencing the performance and yield of field-effect transistors. However, obtaining Dit through conventional electrical measurements is time-consuming and hinders the optimization of the semiconductor fabrication processes. In this study, we demonstrate the potential of second harmonic generation (SHG) as a nondestructive and real-time optical method for Dit detection. By analyzing time-dependent SHG signals, we developed a comprehensive model incorporating charge density evolution and quantum tunneling effects. A simplified equation is derived and fitted to experimental data using a physics-informed neural network (PINN), revealing a strong agreement between theoretical predictions and measured results. The extracted coefficients exhibit a clear correlation with Dit, verified through a conductance–voltage analysis. To improve computational efficiency, we employ PINN with transfer learning, reducing parameter extraction time from 30 min to less than 10 s while maintaining comparable accuracy. This study highlights SHG combined with PINN as a promising alternative to conventional electrical measurements, offering a fast, noninvasive approach for semiconductor interface characterization, which can significantly enhance the efficiency of future device fabrication and optimization.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Mechanical and Optical Resonators · Advancements in Semiconductor Devices and Circuit Design · Force Microscopy Techniques and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics

National Cheng Kung University

The College of Semiconductor and Advanced Technology Research

National Sun Yat-sen University

Department of Electronic Engineering

National Kaohsiung University of Science and Technology

Funding

National Science and Technology Council

References (41)

Show source-provided references
1. 10.1016/j.aca.2016.02.04210.1016/j.aca.2016.02.042 ↗
2. 10.1016/j.mssp.2021.10600210.1016/j.mssp.2021.106002 ↗
3. 10.1016/j.mssp.2024.10811610.1016/j.mssp.2024.108116 ↗
4. 10.1093/nsr/nwae00810.1093/nsr/nwae008 ↗
5. 10.1063/1.11175710.1063/1.111757 ↗
6. 10.1016/0026-2714(95)93068-L10.1016/0026-2714(95)93068-L ↗
7. 10.1109/JEDS.2020.302218010.1109/JEDS.2020.3022180 ↗
8. 10.3390/mi1502026910.3390/mi15020269 ↗
9. 10.1016/j.chphi.2025.10081710.1016/j.chphi.2025.100817 ↗
10. 10.1016/j.surfin.2022.10254110.1016/j.surfin.2022.102541 ↗
11. 10.1016/j.surfin.2023.10323610.1016/j.surfin.2023.103236 ↗
12. 10.1002/adfm.20240600510.1002/adfm.202406005 ↗
13. 10.1021/acsami.3c0498510.1021/acsami.3c04985 ↗
14. 10.1364/OL.20.00206310.1364/OL.20.002063 ↗
15. 10.1103/PhysRevB.59.216410.1103/PhysRevB.59.2164 ↗
16. Yosinski J. · Adv Neural Inf Process Syst · 2014 · 27 · 3320
17. 10.1016/j.jcp.2018.10.04510.1016/j.jcp.2018.10.045 ↗
18. 10.1016/j.tafmec.2019.10244710.1016/j.tafmec.2019.102447 ↗
19. Boyd R. W. · 2008 · 1097
20. 10.1103/PhysRevB.35.112910.1103/PhysRevB.35.1129 ↗
21. 10.1103/physrevb.60.892410.1103/physrevb.60.8924 ↗
22. 10.1016/j.sse.2022.10850210.1016/j.sse.2022.108502 ↗
23. 10.1016/j.sse.2017.12.00610.1016/j.sse.2017.12.006 ↗
24. Mallick, B.; Saha, D.; Datta, A.; Ganguly, S. Optical Probing of Charge Retention Time in Semiconductor/Dielectric Structure. In 2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM); IEEE, 2024; pp 1–3.10.1109/EDTM58488.2024.10511649 ↗
25. 10.1103/PhysRevLett.77.92010.1103/PhysRevLett.77.920 ↗
26. 10.1016/j.snb.2024.13625510.1016/j.snb.2024.136255 ↗
27. Monch W. · 2013
28. 10.1116/1.57752010.1116/1.577520 ↗
29. Zhou, H.; Wang, M.; Zhang, J.; Watanabe, K.; Durfee, C.; Mochizuki, S.; Bao, R.; Southwick, R.; Bhuiyan, M.; Veeraraghavan, B. NBTI impact of surface orientation in stacked gate-all-around nanosheet transistor. In 2020 IEEE International Reliability Physics Symposium (IRPS); IEEE, 2020; pp 1–6.10.1109/IRPS45951.2020.9129023 ↗
30. 10.1063/1.37375910.1063/1.373759 ↗
31. Sze S. M. · 2021
32. 10.1109/23.27749510.1109/23.277495 ↗
33. Bakos, T. Defects in amorphous sio2: Reactions, dynamics and optical properties. Ph.D.Thesis, Vanderbilt University, Nashville, 2003.
34. 10.1149/1.353084510.1149/1.3530845 ↗
35. Reif F. · 2009
36. 10.1103/PhysRevLett.60.104910.1103/PhysRevLett.60.1049 ↗
37. 10.1021/la101004910.1021/la1010049 ↗
38. 10.1364/JOSAB.1.00006710.1364/JOSAB.1.000067 ↗
39. 10.1016/j.mtphys.2020.10022510.1016/j.mtphys.2020.100225 ↗
40. 10.1016/j.mssp.2021.10621710.1016/j.mssp.2021.106217 ↗
41. Kuo, C.W.; Tsai, T.M.; Chang, T.C.; Tu, H.Y.; Chou, S.Y. A novel SCF H 2 O process increasing Hf02 MOSCAP reliability. In 2024 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA); IEEE, 2024; pp 1–5.10.1109/IPFA61654.2024.10690851 ↗