High Frequency and High Gain Split-Gate Monolayer MoS2 Field Effect Transistor for Common Source Amplifier Circuit
Source abstract
Abstract
For analog systems, the field effect transistor (FET) is regarded as one of the fundamental electronic devices. However, its small gain restricts the application of FET in amplifiers and analog circuits. Here, we design a split-gate FET based on monolayer MoS 2 and optimize the key performance index of intrinsic gain ( A v0 ), transconductance frequency product (TFP), and gain frequency product (GFP). The maximum A v0 of 293 V/V and cutoff frequency of hundreds of GHz are obtained by optimizing the control gate positions and input gate voltage. With an equivalent oxide thickness of 0.3 nm, the FET possesses a superior TFP of 7657 GHz/V and GFP of 14148 GHz. In particular, a common source amplifier circuit utilizing the split-gate FET is established, achieving the largest circuit gain of approximately 277 V/V. This work provides a promising route to use split-gate FET to realize a common source amplifier circuit with high circuit gain.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Nanowire Synthesis and Applications · Advancements in Semiconductor Devices and Circuit Design
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Electronic and Electrical Engineering, Henan Normal University, Xinxiang, Henan 453007, China
School of Physics, Henan Normal University, Xinxiang 453007, China
Institute of Physics, Henan Academy of Sciences, Zhengzhou 450046, China
Funding
Henan Province Foundation for University Key Teacher · National Natural Science Foundation of China · Henan Province · Henan Academy of Sciences
References (48)
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