journal article·2022-06-28

Accurate Band Offset Prediction of Sc2O3/GaN and θ-Al2O3/GaN Heterojunctions Using a Dielectric-Dependent Hybrid Functional

Jing Ni, Shunbo Hu, Musen Li, Fanhao Jia, Guanhua Qin, Qiang Li, Zimo Zhou, Fangxing Zha, Wei Ren, Yin Wang

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Abstract

Ultrawide-bandgap semiconductor heterojunctions Sc2O3/GaN and θ-Al2O3/GaN are explored in the framework of density functional theory (DFT). The dielectric-dependent hybrid (DDH) functional, which is superior to other semilocal hybrid functionals in describing the dielectric screening that is dominant in wide-bandgap materials, is adopted in this study. The calculated band gaps of GaN, Sc2O3, and θ-Al2O3 can be well matched to the existing experimental measurements. Both Sc2O3/GaN and θ-Al2O3/GaN heterojunctions present type-I band alignments, and the valence/conduction band offsets of the Sc2O3/GaN and θ-Al2O3/GaN heterojunctions exhibit the values of 0.93/1.89 and 2.25/0.95 eV, respectively. The computational methods and procedures could be used to predict the band offsets of other wide-bandgap semiconductor heterojunctions.
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Research context

OpenAlex topics: Ga2O3 and related materials · GaN-based semiconductor devices and materials · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

International Center for Quantum and Molecular Structures, Materials Genome Institute, Shanghai University, Shanghai 200444, China

Zhejiang Laboratory, Hangzhou 311100, China

School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China

Department of Physics, Shanghai Key Laboratory of High Temperature Superconductors, Shanghai University, Shanghai 200444, China

Funding

National Natural Science Foundation of China · Science and Technology Commission of Shanghai Municipality · Austrian Research Promotion Agency · Zhejiang Laboratory

References (36)

Show source-provided references
1. 10.1002/aelm.20160050110.1002/aelm.201600501 ↗
2. 10.1109/TED.2017.265757910.1109/TED.2017.2657579 ↗
3. 10.35848/1882-0786/abf05410.35848/1882-0786/abf054 ↗
4. 10.1109/16.90645110.1109/16.906451 ↗
5. 10.1063/1.156705110.1063/1.1567051 ↗
6. 10.1063/1.477007110.1063/1.4770071 ↗
7. 10.1149/1.162337310.1149/1.1623373 ↗
8. 10.1063/1.489598510.1063/1.4895985 ↗
9. 10.1063/1.474926810.1063/1.4749268 ↗
10. 10.1109/LED.2021.308026010.1109/LED.2021.3080260 ↗
11. 10.1016/j.jallcom.2020.15714410.1016/j.jallcom.2020.157144 ↗
12. 10.1002/pssb.20160068110.1002/pssb.201600681 ↗
13. 10.1063/1.480773610.1063/1.4807736 ↗
14. 10.1063/1.473758310.1063/1.4737583 ↗
15. 10.1063/1.219431410.1063/1.2194314 ↗
16. 10.1002/pssc.20067470210.1002/pssc.200674702 ↗
17. 10.1063/1.509756710.1063/1.5097567 ↗
18. 10.1103/PhysRevMaterials.2.07380310.1103/PhysRevMaterials.2.073803 ↗
19. 10.1016/0927-0256(96)00008-010.1016/0927-0256(96)00008-0 ↗
20. 10.1103/PhysRevB.54.1116910.1103/PhysRevB.54.11169 ↗
21. 10.1016/j.jcrysgro.2006.11.33810.1016/j.jcrysgro.2006.11.338 ↗
22. Husson E. · Eur. J. Solid State Inorg. Chem. · 1996 · 33 · 1223
23. 10.1103/PhysRevB.76.24511010.1103/PhysRevB.76.245110 ↗
24. 10.1016/j.jssc.2007.09.02210.1016/j.jssc.2007.09.022 ↗
25. 10.1002/pssb.20170032310.1002/pssb.201700323 ↗
26. 10.1103/PhysRevB.23.504810.1103/PhysRevB.23.5048 ↗
27. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗
28. 10.1103/PhysRevB.45.1324410.1103/PhysRevB.45.13244 ↗
29. 10.1103/PhysRevB.79.15510710.1103/PhysRevB.79.155107 ↗
30. 10.1103/PhysRevB.84.03511710.1103/PhysRevB.84.035117 ↗
31. 10.1103/PhysRevLett.115.03640210.1103/PhysRevLett.115.036402 ↗
32. 10.1039/D1SC03738B10.1039/D1SC03738B ↗
33. 10.1063/1.329344010.1063/1.3293440 ↗
34. 10.1155/2015/46948710.1155/2015/469487 ↗
35. 10.1016/j.mee.2009.03.01110.1016/j.mee.2009.03.011 ↗
36. 10.1116/1.59147210.1116/1.591472 ↗