A Strategy for Fabricating Microscale Freestanding Single-Crystalline Complex Oxide Device Arrays

We present a general fabrication strategy for freestanding single-crystalline complex oxide device arrays via wet chemical etching-based microfabrication processes and epitaxial lift-off. Here, we used 0.5Ba(Zr 0.2 Ti 0.8 )O 3 -0.5Ba(Zr 0.7 Ti 0.3 )O 3 (BCZT) as a model relaxor ferroelectric oxide system and La 0.7 Sr 0.3 MnO 3 as the sacrificial layer for demonstration. Arrays of SrRuO 3 (SRO)/BCZT/SRO ferroelectric capacitor mesas were first defined and isolated on the growth wafer, and then they were released using epitaxial lift-off with lithography-defined surrounding etching holes, after which the freestanding device arrays were integrated onto a glass substrate. Our proposed strategy sheds light on preparing various freestanding single-crystalline oxide devices and paves the way for their heterogeneous integration onto arbitrary substates.