Fabrication and Characterization of Printed Phototransistors Based on Monochalcogenide Inks
Source abstract
Abstract
Two-dimensional (2D) layered semiconductors of Group-III monochalcogenides have gained increasing attention in photonics and electronics. The fabrication of large-scale, inexpensive inks which can be used in printed electronics applications is facilitated by the solution processing of 2D materials. In this study, gallium sulfide (GaS)-, gallium selenide (GaSe)-, and gallium telluride (GaTe)-loaded inks were synthesized and implemented to fabricate phototransistors on SiO 2 \Si substrates. To explore the printed device performances, several color illuminations were applied to the printed phototransistor, and the mobility, photoresponsivity, and external quantum efficiency parameters were compared. Under red-light illumination, the mobility of a GaTe nanoparticle-based phototransistor reached 7.456 cm 2 V –1 s –1 . The responsivity of the GaTe-based phototransistor was found to be the highest, with the value of 9.52 A W –1 under green light illumination. However, GaSe-based phototransistors gave the highest EQE value of 2482 (%) under blue light illumination with the mobility of 7.04 cm 2 V –1 s –1 . This study demonstrates that printable Group-III monochalcogenide inks can be synthesized with desired properties for use in printed electronic applications.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Perovskite Materials and Applications · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electrical and Electronics Engineering, Bursa Uludag University, 16120 Bursa, Türkiye
Silicon Austria Labs GmbH, 9524 Villach, Austria
National Nanotechnology Research Center─UNAM, Bilkent University, 06800 Ankara, Türkiye
Funding
Steirische Wirtschaftsf?rderungsgesellschaft · Silicon Austria Labs · T?rkiye Bilimsel ve Teknolojik Arastirma Kurumu · Amt der K?rntner Landesregierung · Upper Austrian Research · Fachverband der Elektro- und Elektronikindustrie
References (32)
Show source-provided references
1. 10.1038/srep0549710.1038/srep05497 ↗
2. 10.1021/nl400107k10.1021/nl400107k ↗
3. 10.1021/acsaelm.9b0077010.1021/acsaelm.9b00770 ↗
4. 10.1063/1.497391810.1063/1.4973918 ↗
5. 10.3389/fchem.2021.78146710.3389/fchem.2021.781467 ↗
6. 10.1016/j.cplett.2016.03.04510.1016/j.cplett.2016.03.045 ↗
7. 10.1002/adma.20190695810.1002/adma.201906958 ↗
8. 10.1039/c3nr05965k10.1039/c3nr05965k ↗
9. 10.1021/acs.jpcc.1c0359710.1021/acs.jpcc.1c03597 ↗
10. 10.1021/acsami.8b1981710.1021/acsami.8b19817 ↗
11. 10.1016/j.sna.2020.11238810.1016/j.sna.2020.112388 ↗
12. 10.3390/nano1112344110.3390/nano11123441 ↗
13. 10.1007/s10854-020-03718-810.1007/s10854-020-03718-8 ↗
14. 10.1021/ja403533510.1021/ja4035335 ↗
15. 10.1016/j.elecom.2020.10686710.1016/j.elecom.2020.106867 ↗
16. 10.1016/j.jmst.2013.09.01610.1016/j.jmst.2013.09.016 ↗
17. 10.1016/j.omx.2022.10013510.1016/j.omx.2022.100135 ↗
18. 10.1002/adfm.20190957210.1002/adfm.201909572 ↗
19. 10.1039/c6cp01963c10.1039/c6cp01963c ↗
20. 10.3390/cryst802007410.3390/cryst8020074 ↗
21. 10.1063/1.493303410.1063/1.4933034 ↗
22. 10.1107/s160057672001653210.1107/s1600576720016532 ↗
23. 10.1180/minmag.1965.035.271.1510.1180/minmag.1965.035.271.15 ↗
24. 10.1007/bf0072146010.1007/bf00721460 ↗
25. 10.1107/s056774087901080310.1107/s0567740879010803 ↗
26. 10.1002/aelm.20200108010.1002/aelm.202001080 ↗
27. 10.1021/acsanm.8b0068410.1021/acsanm.8b00684 ↗
28. 10.1021/nn405403910.1021/nn4054039 ↗
29. 10.1016/j.orgel.2017.07.02210.1016/j.orgel.2017.07.022 ↗
30. 10.1002/adma.20120136110.1002/adma.201201361 ↗
31. 10.1021/nn300889c10.1021/nn300889c ↗
32. 10.1021/acsphotonics.8b0106610.1021/acsphotonics.8b01066 ↗