journal article·2023-04-25

High-Performance Organic Field-Effect Transistors Using Rare Earth Metal Oxides as Dielectrics

Filipp Talalaev, Sergey Luchkin, Alexander V. Mumyatov, Ivan S. Zhidkov, Maxim V. Lobanov, Nikita A. Emelianov, Sergey D. Babenko, Ernst Z. Kurmaev, Sergey M. Aldoshin, Pavel A. Troshin

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Abstract

Rare earth metal oxides (REOs) represent promising gate dielectric materials for field-effect transistors due to their high dielectric constants required for suppressing leakage currents in devices. In this paper, we present an approach to deposition of uniform REO gate dielectric coatings by oxidation of thin rare earth metal films in air at relatively low temperatures (100–250 °C). The proposed methodology was extensively explored in organic field-effect transistors (OFETs) using five benchmark organic semiconductors and six REOs as gate dielectrics. It was shown that OFETs with the REO gate dielectrics deliver on average considerably better characteristics compared to the reference devices using electrochemically grown aluminum oxide dielectric (AlO x ). OFETs on a flexible plastic substrate were demonstrated, which makes this approach very attractive for developing flexible and wearable electronic devices with improved performance.
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Research context

OpenAlex topics: Semiconductor materials and devices · Organic Electronics and Photovoltaics · Advanced Memory and Neural Computing

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Affiliations

Federal Research Center of Problems of Chemical Physics and Medicinal Chemistry, Russian Academy of Sciences, (FRC PCP MC RAS), Academician Semenov Avenue 1, Chernogolovka, Moscow Region, 142432, Russian Federation

Skolkovo Institute of Science and Technology, Nobel Street 3, Moscow, 143026, Russian Federation

Institute of Physics and Technology, Ural Federal University, Mira Street 19, Yekaterinburg, 620108, Russian Federation

M. N. Mikheev Institute of Metal Physics of Ural Branch of Russian Academy of Sciences, S. Kovalevskoi Street 18, Yekaterinburg, 620108, Russian Federation

Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States

Chernogolovka branch of the N.N. Semenov Federal Research Center for Chemical Physics of RAS, Academician Semenov Street 1/10, Chernogolovka, 142432, Russian Federation

Harbin Institute of Technology, 92 West Dazhi Street, Nan Gang District, Harbin, Heilongjiang Province 150001, China

Zhengzhou Research Institute of HIT, 26 Longyuan East 7th, Jinshui District, Zhengzhou, Henan Province, 450000, China

Funding

Ministry of Science and Higher Education of Russian Federation

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