journal article·2019-10-22

Sub-5 nm Monolayer BiH Transistors

Meng Ye, Shiqi Liu, Han Zhang, Bowen Shi, Jingzhen Li, Xiuying Zhang, Jiahuan Yan, Jing Lu

ACS Applied Electronic Materials· Volume 1· Issue 10
Publisher page

Abstract

Two-dimensional (2D) semiconductors are expected to be suitable channel materials for next-generation transistors because of their ultrathin thickness and smooth surface. Monolayer (ML) BiH (bismuthane) is predicted to have a bandgap of about 1.0 eV opened by spin–orbital coupling (SOC). In this article, we provide the first investigation of the performance limits of ML BiH transistors based on ab initio quantum transport simulation methods with full consideration of the SOC effect. The performance limits of the optimized 5 nm ML BiH transistor can satisfy the high-performance device requirement of the International Technology Roadmap for Semiconductors in the next decade, so ML BiH is attractive for applications in nanoelectronics.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Graphene research and applications · Topological Materials and Phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, P. R. China

Beijing Key Laboratory for Magnetoelectric Materials and Devices, Beijing 100871, P. R. China

Funding

Ministry of Science and Technology of the People's Republic of China · National Natural Science Foundation of China · High-performance Computing Platform of Peking University

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