Ga 2 O 3 Deep-Ultraviolet Photodetectors: Materials, Device Architectures, and Performance Frontiers
Source abstract
Abstract
Deep-ultraviolet (DUV) photodetectors operating in the solar-blind region (200–280 nm) are of critical importance for defense, space exploration, environmental monitoring, flame detection, and secure optical communication. Among ultrawide-bandgap semiconductors, gallium oxide (Ga 2 O 3 ) has emerged as a leading material platform owing to its large intrinsic bandgap, visible-blind response, high breakdown electric field, and compatibility with scalable growth technologies. This review provides a comprehensive and structured analysis of Ga 2 O 3 -based DUV photodetectors, covering nanostructured devices, metal–semiconductor–metal architectures, junction-based photodiodes, avalanche photodetectors, and field-effect-transistor-based photodetectors. Emphasis is placed on structure–property–performance relationships, underlying physical mechanisms, and key trade-offs governing responsivity, detectivity, gain, and response speed.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ga2O3 and related materials · Advanced Photocatalysis Techniques · GaN-based semiconductor devices and materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Chongqing Key Laboratory of Multi-Scale Manufacturing Technology, Chongqing School of University of Chinese Academy of Sciences, Chongqing Institute of Green and Intelligent Technology
Chinese Academy of Sciences
School of Electronic Science and Engineering
Chongqing University of Posts and Telecommunications
Funding
Natural Science Foundation of Chongqing Municipality · Chongqing Natural Science Foundation Innovation and Development Joint Fund
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