journal article·2026-01-13

Improving the Photodetector Performance of β-Ga 2 O 3 Thin Film by Mg Diffusion

Yiwen Wu, Xuexi Yan, Xinwei Wang, Yixiao Jiang, Tingting Yao, Hengqiang Ye, Chunlin Chen

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Abstract

Gallium oxide (Ga 2 O 3 ) is a solar-blind photodetector material widely used in people’s daily lives and the field of national defense due to its wide and direct band gap, excellent chemical stability, and good thermal conductivity. However, vacancies of Ga and lattice O atoms in the film significantly degrade device performance. Here, high-quality β-Ga 2 O 3 thin films were grown on MgO and Al 2 O 3 substrates by pulsed laser deposition (PLD) method. The microstructure and chemical composition were characterized by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). It was found that Mg in the MgO substrate diffuses into the β-Ga 2 O 3 thin film, while atoms in the Al 2 O 3 substrate do not diffuse. The diffused Mg will suppress the loss of O, which can increase the proportion of lattice O. Photodetector performance measurements reveal that due to the diffusion of Mg, the β-Ga 2 O 3 photodetector grown on MgO substrate has higher photocurrent (6.03 × 10 –5 A) and detectivity (1.2 × 10 13 Jones) at a response wavelength of 254 nm. Importantly, the responsivity and external quantum efficiency (EQE) of the heteroepitaxial β-Ga 2 O 3 /MgO film-based photodetector are as high as 7.94 A/W and 3900% which are more than 25 times higher than the photodetector based on the β-Ga 2 O 3 /Al 2 O 3 and are one of the best values of β-Ga 2 O 3 based photodetectors at present. Our findings shed light on applying high-performance solar-blind photodetectors and related optoelectronic devices.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Ga2O3 and related materials · Advanced Photocatalysis Techniques · GaN-based semiconductor devices and materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Shenyang National Laboratory for Materials Science

Institute of Metal Research, Chinese Academy of Sciences

Nano Science and Technology Institute

University of Science and Technology of China

School of Materials Science and Engineering

Ji Hua Laboratory

Funding

Jihua Laboratory · Basic and Applied Basic Research Foundation of Guangdong Province · China Postdoctoral Science Foundation · National Natural Science Foundation of China

References (43)

Show source-provided references
1. 10.1002/adfm.20100114010.1002/adfm.201001140 ↗
2. 10.1063/1.488991410.1063/1.4889914 ↗
3. 10.1002/adfm.20170637910.1002/adfm.201706379 ↗
4. 10.1002/adfm.20150023110.1002/adfm.201500231 ↗
5. 10.1016/j.actamat.2023.11916910.1016/j.actamat.2023.119169 ↗
6. 10.1007/s12274-024-6564-x10.1007/s12274-024-6564-x ↗
7. 10.1016/j.apsusc.2024.15940010.1016/j.apsusc.2024.159400 ↗
8. 10.1021/acsomega.2c0334510.1021/acsomega.2c03345 ↗
9. 10.1002/admt.20210014210.1002/admt.202100142 ↗
10. 10.1002/adma.20170626210.1002/adma.201706262 ↗
11. 10.1002/adfm.20190990910.1002/adfm.201909909 ↗
12. 10.1016/j.apsusc.2021.15101010.1016/j.apsusc.2021.151010 ↗
13. 10.1109/TED.2023.328337310.1109/TED.2023.3283373 ↗
14. 10.1016/j.mtphys.2019.10015710.1016/j.mtphys.2019.100157 ↗
15. 10.1002/pssa.20210007610.1002/pssa.202100076 ↗
16. 10.1088/1674-4926/44/6/06280210.1088/1674-4926/44/6/062802 ↗
17. 10.1126/sciadv.abd589110.1126/sciadv.abd5891 ↗
18. 10.1002/adma.20170626210.1002/adma.201706262 ↗
19. 10.1088/1361-6463/ab7e6710.1088/1361-6463/ab7e67 ↗
20. 10.1063/1.514299910.1063/1.5142999 ↗
21. 10.1016/j.carbon.2022.08.06510.1016/j.carbon.2022.08.065 ↗
22. 10.1038/s41467-023-38548-910.1038/s41467-023-38548-9 ↗
23. 10.1021/acsami.2c1014310.1021/acsami.2c10143 ↗
24. 10.1016/j.apsusc.2018.12.04510.1016/j.apsusc.2018.12.045 ↗
25. 10.1016/j.mtphys.2022.10064310.1016/j.mtphys.2022.100643 ↗
26. 10.1063/5.016081710.1063/5.0160817 ↗
27. 10.1016/j.apsusc.2021.14961910.1016/j.apsusc.2021.149619 ↗
28. 10.1039/C6TC01602B10.1039/C6TC01602B ↗
29. 10.1016/j.mtadv.2023.10040210.1016/j.mtadv.2023.100402 ↗
30. 10.1002/admi.20180014710.1002/admi.201800147 ↗
31. 10.1039/C7CS00315C10.1039/C7CS00315C ↗
32. 10.1021/acsomega.2c0488810.1021/acsomega.2c04888 ↗
33. 10.1063/5.018092210.1063/5.0180922 ↗
34. 10.1021/acsomega.1c0585910.1021/acsomega.1c05859 ↗
35. 10.1149/2162-8777/ac5d6510.1149/2162-8777/ac5d65 ↗
36. 10.1016/j.mtphys.2022.10069710.1016/j.mtphys.2022.100697 ↗
37. 10.1063/1.499077910.1063/1.4990779 ↗
38. 10.1016/j.jallcom.2025.18515010.1016/j.jallcom.2025.185150 ↗
39. 10.1063/5.007261110.1063/5.0072611 ↗
40. 10.1016/j.apsusc.2023.15764110.1016/j.apsusc.2023.157641 ↗
41. 10.1016/j.jallcom.2017.11.03710.1016/j.jallcom.2017.11.037 ↗
42. 10.1016/j.vacuum.2021.11040210.1016/j.vacuum.2021.110402 ↗
43. 10.1016/j.vacuum.2025.11428210.1016/j.vacuum.2025.114282 ↗