journal article·2025-01-14

Design and Verification of Optoelectronic Performance of Full GaN MSM and μLED Homogeneous Integrated Devices

Chao Chen, Wenjuan Su, Juncheng Lin, Huichen Fan, Yibin Lin, Jinyu Ye, Xiongtu Zhou, Tailiang Guo, Chaoxing Wu, Yongai Zhang

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Abstract

This study presents a metal–semiconductor–metal (MSM) and micro-light-emitting diode (μLED) integrated device (MSM−μLED) without additional epitaxial growth, which demonstrates excellent performance in ultraviolet (UV) detection and optoelectronic modulation. By employing an approach that combines vertical and lateral integration, the rapid response characteristic of the MSM is utilized to control the current required to activate the μLED, thereby enhancing the LED’s luminous efficiency. The MSM−μLED device was simulated using Silvaco TCAD software, by optimizing the device structure parameters, such as doping concentration, material thickness, and electrode length, and adjusting the wavelength and intensity of ultraviolet light, the photocurrent value was enhanced to be approximately 6 orders of magnitude higher than the dark current, successfully achieving microampere-level currents to illuminate the μLED. Under irradiation at 365 nm wavelength, the device exhibited maximum photocurrent. Experimental validation confirmed that MSM−μLED exhibited significant photocurrent enhancement under UV illumination, indicating its promising potential for high-performance applications in environmental monitoring, high-speed optical communication, and biomedical imaging.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Advanced Manufacturing, Fuzhou University, 362251 Quanzhou, China

. College of Physics and Information Engineering, Fuzhou University, Fuzhou 350108, P. R. China

Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350108, P. R. China

Funding

National Key Research and Development Program of China · Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China

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