journal article·2024-10-22

Effects of Halide Composition on Endurance and Retention Performance in Double Perovskite Resistive Switching Memory

SangMyeong Lee, Jae Myeong Lee, Won Bin Kim, Hyun Suk Jung

ACS Applied Electronic Materials· Volume 6· Issue 10
Publisher page

Abstract

Due to their low operating voltage, high on/off ratio, and tunable band gap, Cs 2 AgBiBr 6– x Cl x halide double perovskites (DPs) are being considered as promising materials for lead-free resistive switching (RS) memory devices. However, while the performance of conventional halide DP-based RS memory devices can be significantly improved by changing composition of halide materials, the mechanisms behind materials composition and its effects on performance are often insufficiently understood. This study reports on the effects of halide composition in DP-based RS memory devices. The Cs 2 AgBiBr 4 Cl 2 device demonstrates enhanced properties, with an endurance of 6500 cycles at room temperature and a retention of 10000 s at 100 °C. The thermal ion activation energy and time-of-flight secondary-ion-mass spectrometry revealed that the halide DP-based RS memory devices operate via an electrochemical metallization mechanism due to the migration of Cu ions. Additionally, studies on cohesive energies through first-principles simulations and thermal stability via thermogravimetric analysis demonstrate that the improved stability of halide DPs effectively increases the formation voltage by retarding Cu ion migration, thereby leading to enhanced endurance and retention properties. This report proposes a relationship between the change in halide composition and endurance and retention properties of lead-free DP-based RS memory devices.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Perovskite Materials and Applications · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea

SKKU Institute of Energy Science and Technology (SIEST), Sungkyunkwan University, Suwon 16419, Republic of Korea

Funding

Defense Acquisition Program Administration · National Research Foundation of Korea

References (42)

Show source-provided references
1. 10.1021/acs.jpclett.2c0130310.1021/acs.jpclett.2c01303 ↗
2. 10.1002/sstr.20217001010.1002/sstr.202170010 ↗
3. Li B. · Adv. Sci. · 2024 · 11 · 202310263
4. 10.1002/adma.20200500010.1002/adma.202005000 ↗
5. 10.1021/acs.jpclett.1c0233210.1021/acs.jpclett.1c02332 ↗
6. 10.1007/s40820-022-00983-610.1007/s40820-022-00983-6 ↗
7. 10.1021/acsami.1c0343310.1021/acsami.1c03433 ↗
8. 10.1039/D0NR08214G10.1039/D0NR08214G ↗
9. 10.1002/admt.20190003710.1002/admt.201900037 ↗
10. 10.1038/nmat457210.1038/nmat4572 ↗
11. 10.1038/s41893-020-00645-810.1038/s41893-020-00645-8 ↗
12. 10.1021/acsenergylett.1c0283610.1021/acsenergylett.1c02836 ↗
13. 10.1021/acsami.9b0908010.1021/acsami.9b09080 ↗
14. 10.1021/acsami.8b1576910.1021/acsami.8b15769 ↗
15. 10.1039/D0TA06248K10.1039/D0TA06248K ↗
16. 10.1002/adfm.20200265310.1002/adfm.202002653 ↗
17. 10.1002/smll.20200322510.1002/smll.202003225 ↗
18. 10.1021/acs.jpclett.0c0376310.1021/acs.jpclett.0c03763 ↗
19. 10.1002/admi.20220056210.1002/admi.202200562 ↗
20. 10.1016/j.jallcom.2022.16530010.1016/j.jallcom.2022.165300 ↗
21. 10.1016/j.ceramint.2022.04.16110.1016/j.ceramint.2022.04.161 ↗
22. 10.1039/D3TC00350G10.1039/D3TC00350G ↗
23. 10.1016/j.jallcom.2023.17277110.1016/j.jallcom.2023.172771 ↗
24. 10.1038/s41524-020-00383-710.1038/s41524-020-00383-7 ↗
25. 10.1088/0953-8984/21/39/39550210.1088/0953-8984/21/39/395502 ↗
26. 10.1088/1361-648X/aa8f7910.1088/1361-648X/aa8f79 ↗
27. Virtual Lab. Inc. (2017, January 01). Materials Square. https://www.materialssquare.com/.
28. 10.1021/acs.jpcc.9b1182710.1021/acs.jpcc.9b11827 ↗
29. 10.1039/D2TC03905B10.1039/D2TC03905B ↗
30. 10.1016/j.chemphys.2019.11054710.1016/j.chemphys.2019.110547 ↗
31. 10.1016/1350-4495(94)90026-410.1016/1350-4495(94)90026-4 ↗
32. 10.1063/1.502741410.1063/1.5027414 ↗
33. 10.1002/adom.20230158310.1002/adom.202301583 ↗
34. 10.1021/acsami.9b2291810.1021/acsami.9b22918 ↗
35. 10.1021/acsami.1c1321010.1021/acsami.1c13210 ↗
36. 10.1002/adma.20230733410.1002/adma.202307334 ↗
37. 10.1002/adfm.20190668610.1002/adfm.201906686 ↗
38. 10.1063/1.243766810.1063/1.2437668 ↗
39. 10.3390/electronics403058610.3390/electronics4030586 ↗
40. 10.1007/s10904-023-02939-810.1007/s10904-023-02939-8 ↗
41. 10.1039/C1CC11328C10.1039/C1CC11328C ↗
42. 10.1002/crat.20190022210.1002/crat.201900222 ↗