journal article·2013-10

One-dimensional ZnO nanostructures: fabrication, optoelectronic properties, and device applications

Debashis Panda, Tseung-Yuen Tseng

Journal of Materials Science· Volume 48· Issue 20
Publisher page

Abstract

One-dimensional (1D) zinc oxide (ZnO) nanostructures have been extensively and intensively studied for several decades not only for their extraordinary chemical and physical properties, but also for their current and future different electronic and optoelectronic device applications. This review provides a brief overview of the progress of different synthesis methods and applications of 1D-ZnO nanostructures. Morphology of ZnO nanostructures grown by various methods and progress in the optical properties are briefly described. Using low-temperature photoluminescence (LTPL) study, detailed informations about the defect states and impurity of such nanostructures are reported. Improvement of field emission properties by modifying the edge of 1D-ZnO nanostructures is briefly discussed. Applications such as different sensors, field effect transistor, light-emitting diodes (LEDs), and photodetector are briefly reviewed. ZnO has large exciton binding energy (60 meV) and wide band gap (3.37 eV), which could lead to lasing action based on exciton recombination. As semiconductor devices are being aggressively scaled down, ZnO 1D nanostructures based resistive switching (RS) memory (resistance random access memory) is very attractive for nonvolatile memory applications. Switching properties and mechanisms of Ga-doped and undoped ZnO nanorods/NWs are briefly discussed. The present paper reviews the recent activities of the growth and applications of various 1D-ZnO nanostructures for sensor, LED, photodetector, laser, and RS memory devices.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (100+)

Show source-provided references
1. Liang WY, Yoffe AD (1968) Phys Rev Lett 20:5910.1103/PhysRevLett.20.59 ↗
2. Jin BJ, Im S, Lee SY (2000) Thin Solid Films 366:10710.1016/S0040-6090(00)00746-X ↗
3. Huang MH, Mao S, Feick H, Yan H, Wu Y, Kind H, Weber E, Russo R, Yang P (2001) Science 292:189710.1126/science.1060367 ↗
4. Ryu YR, Zhu S, Budai JD, Chandrasekhar HR, Miceli PF, White HW (2000) J Appl Phys 88:20110.1063/1.373643 ↗
5. Shan FK, Shin BC, Kim SC, Yu YS (2004) J Eur Ceram Soc 24:186110.1016/S0955-2219(03)00489-8 ↗
6. Bunn CW (1935) Proc Phys Soc Lond 47:83510.1088/0959-5309/47/5/307 ↗
7. Damen TC, Porto SPS, Tell B (1966) Phys Rev 142:57010.1103/PhysRev.142.570 ↗
8. Galli G, Coker JE (1970) Appl Phys Lett 16:43910.1063/1.1653058 ↗
9. Mead CA (1965) Phys Lett 18:21810.1016/0031-9163(65)90295-7 ↗
10. Brillson LJ (1978) J Vac Sci Technol 15:137810.1116/1.569792 ↗
11. Brown HE (1957) Zinc oxide discovery. The New Jersey Zinc Company, New York
12. Brown HE (1976) Zinc oxide properties and applications. The New Jersey Zinc Company, New York
13. Miller PH Jr (1950) In: Henisch HK (ed) Proceedings of the international conference on semiconductor materials, Reading. Butterworth Scientific, London, p 172
14. Heiland H, Mollwo E, Stöckmann F (1959) Solid State Phys 8:19110.1016/S0081-1947(08)60481-6 ↗
15. Mandal S, Singha RK, Dhar A, Ray SK (2008) Mater Res Bull 43:24410.1016/j.materresbull.2007.05.006 ↗
16. Wei A, Sun XW, Wang JX (2006) Appl Phys Lett 89:12390210.1063/1.2356307 ↗
17. Zhao ZW, Chen XJ, Tay BK, Chen JS, Han ZJ, Khor KA (2007) Biosens Bioelectron 23:13510.1016/j.bios.2007.03.014 ↗
18. Klingshirn C (2007) Phys Status Solidi B 244:302710.1002/pssb.200743072 ↗
19. Pan ZW, Dai ZR, Wang ZL (2001) Science 291:194710.1126/science.1058120 ↗
20. Wang ZL (2004) J Phys: Condens Matter 16:R82910.1088/0953-8984/16/25/R01 ↗
21. Wang ZL (2007) Appl Phys A 88:710.1007/s00339-007-3942-8 ↗
22. Kukreja LM, Misra P, Fallert J, Sartor J, Kalt H, Klingshirn C (2008) 2008 IEEE photonics global @Singapore IPGC 1
23. Willander M, Nur O, Zhao QX, Yang LL, Lorenz M, Cao BQ, Zúñiga Pérez J, Czekalla C, Zimmermann G, Grundmann M, Bakin A, Behrends A, Al-Suleiman M, El-Shaer A, Mofor AC, Postels B, Waag A, Boukos N, Travlos A, Kwack HS, Guinard J, Dang DLS (2009) Nanotechnology 20:33200110.1088/0957-4484/20/33/332001 ↗
24. Wang ZL, Song J (2006) Science 312:24210.1126/science.1124005 ↗
25. Yichun L, Mingya Z, Guiye S, Yajun L, Baiqu H, Guoliang Y (2008) J Phys Chem B 112:648410.1021/jp710399d ↗
26. Al-Hilli SM, Al-Mofarji RT, Willander M (2006) Appl Phys Lett 89:17311910.1063/1.2367662 ↗
27. Sadik PW, Pearton SJ, Norton DP, Lambers E, Ren F (2007) J Appl Phys 101:10451410.1063/1.2736893 ↗
28. Wang ZL (2007) Mater Today 10:2010.1016/S1369-7021(07)70076-7 ↗
29. Ronning C, Gao PX, Ding Y, Wang ZL, Schwen D (2004) Appl Phys Lett 84:78310.1063/1.1645319 ↗
30. Qingyu X, Hartmann L, Shengqiang Z, Mcklich A, Helm M, Biehne G, Hochmuth H, Lorenz M, Grundmann M, Schmidt H (2008) Phys Rev Lett 101:07660110.1103/PhysRevLett.101.076601 ↗
31. Yi GC, Wang C, Park W II (2005) Semicond Sci Technol 20:s2210.1088/0268-1242/20/4/003 ↗
32. Cho S, Jeong H, Park DH, Jung SH, Kim HJ, Lee KH (2010) Cryst Eng Commun 12:96810.1039/B916750A ↗
33. Kang DS, Han SK, Kim JH, Yang SM, Kim JG, Hong SK, Kim D, Kim H (2009) J Vac Sci Technol B 27:166710.1116/1.3137020 ↗
34. Hsueh TJ, Chen YW, Chang SJ, Wang SF, Hsu CL, Lin YR, Lin TS, Chen IC (2007) J Electrochem Soc 154:J39310.1149/1.2789813 ↗
35. Ra HW, Choi DH, Kim SH, Im YH (2009) J Phys Chem C 113:351210.1021/jp8085304 ↗
36. Wang X, Summers CJ, Wang ZL (2004) Nano Lett 4:42310.1021/nl035102c ↗
37. Panigrahi S, Basak D (2011) Nanoscale 3:2336234110.1039/c1nr10064e ↗
38. Liu DF, Xiang YJ, Liao Q, Zhang JP, Zhang ZX, Liu LF, Ma WJ, Shen J, Zhou WY, Xie SS (2007) Nanotechnology 18:40530310.1088/0957-4484/18/40/405303 ↗
39. Wei Y, Dong Y, Li C, Xu S, Ryo JH, Dupuis R, Sood AK, Polla DL, Wang ZL (2008) J Phys Chem C 112:1893510.1021/jp807616y ↗
40. Lao CS, Liu J, Gao P, Zhang L, Davidovic D, Tummala R, Wang ZL (2006) Nano Lett 6:26310.1021/nl052239p ↗
41. Liu B, Zeng HC (2009) Nano Res 2:20110.1007/s12274-009-9018-7 ↗
42. Han J, Fan F, Xu C, Lin S, Wei M, Duan X, Wang ZL (2010) Nanotechnology 21:40520310.1088/0957-4484/21/40/405203 ↗
43. Gao PX, Ding Y, Wang ZL (2009) Nano Lett 9:13710.1021/nl802682c ↗
44. Gao H, Zhang X, Zhou M, Zhou E, Zhang E, Zhang Z (2006) Solid state Commun 140:45510.1016/j.ssc.2006.09.012 ↗
45. Hughes WL, Wang ZL (2005) Appl Phys Lett 86:04310610.1063/1.1853514 ↗
46. Kong XY, Ding Y, Yang R, Wang ZL (2004) Science 303:134810.1126/science.1092356 ↗
47. Xing YJ, Xi ZH, Zhang XD, Song JH, Wang RM (2005) Appl Phys A 80:152710.1007/s00339-003-2388-x ↗
48. Zhang YS, Wang LS, Liu X, Yan YJ, Chen CQ, Zhu J (2005) J Phys Chem B 109:1309110.1021/jp050851z ↗
49. Lv H, Sang DD, Li HD, Du XB, Li DM, Zou GT (2010) Nanoscale Res Lett 5:62010.1007/s11671-010-9524-2 ↗
50. Calestani D, Zha MZ, Zanotti L, Villani M, Zappettini A (2011) Cryst Eng Commun 13:170710.1039/C0CE00670J ↗
51. Park WI, Kim DH, Jung SW, Yi GC (2002) Appl Phys Lett 80:423210.1063/1.1482800 ↗
52. Park W, Yi GC (2004) Adv Mater 16:8710.1002/adma.200305729 ↗
53. Ishikawa Y, Shimizu Y, Sasaki T, Koshizaki N (2006) J Colloid Interface Sci 300:61210.1016/j.jcis.2006.04.005 ↗
54. He H, Cai W, Lin Y, Chen B (2010) Langmuir 26:892510.1021/la904723a ↗
55. Zhao Y, Uk Kwon Y (2004) Chem Lett 33:157810.1246/cl.2004.1578 ↗
56. Liu B, Zeng HC (2003) J Am Chem Soc 125:443010.1021/ja0299452 ↗
57. Akhavan O, Mehrabian M, Mirabbaszadeh K, Azimirad R (2009) J Phys D 42:22530510.1088/0022-3727/42/22/225305 ↗
58. Guo M, Diao P, Cai S (2005) Appl Surf Sci 249:7110.1016/j.apsusc.2004.11.053 ↗
59. Park SK, Park JH, Ko KY, Yoon S, Chu KS, Kim W, Do YR (2009) Cryst Growth Des 9:361510.1021/cg9003593 ↗
60. Chander R, Raychaudhuri AK (2008) Solid State Commun 145:8110.1016/j.ssc.2007.09.031 ↗
61. Iijima S, Ichihashi T (1993) Nature 363:60310.1038/363603a0 ↗
62. Xu S, Qin Y, Wei Y, Yang RY, Wang ZL (2010) Nat Nanotech 5:36610.1038/nnano.2010.46 ↗
63. Wang B, Zhu LF, Yang YH, Xu NS, Yang GW (2008) J Phys Chem C 112:664310.1021/jp8003147 ↗
64. Heer WA, Chatelain A, Ugarte D (1995) Science 270:117910.1126/science.270.5239.1179 ↗
65. Soci C, Zhang A, Bao XY, Kim H, Wang D (2010) J Nanosci Nanotechnol 10:110.1166/jnn.2010.2157 ↗
66. Pauporte T, Lincot D (1999) Appl Phys Lett 75:381710.1063/1.125466 ↗
67. Levy-Clement C, Tena-Zaera R, Ryan MA, Katty A, Hodes G (2005) Adv Mater 17:151210.1002/adma.200401848 ↗
68. Tena-Zaera R, Katty A, Bastide S, Levy-Clement C, O’Regan B, Munoz-Sanjose V (2005) Thin Solid Films 483:37210.1016/j.tsf.2005.01.010 ↗
69. Guo M, Yang CY, Zhang M, Zhang Y-J, Ma T, Wang X-D, Wang X-D (2008) Electrochim Acta 53:463310.1016/j.electacta.2008.01.061 ↗
70. Chen Z, Gao L (2006) J Cryst Growth 293:52210.1016/j.jcrysgro.2006.05.082 ↗
71. Wang Z, Qian ZF, Yin J, Zhu ZK (2004) Langmuir 20:344110.1021/la036098n ↗
72. Li Q, Kumar V, Li Y, Zhang H, Mark JT, Chang RPH (2005) Chem Mater 17:100110.1021/cm048144q ↗
73. Yao I-C, Lin P, Huang S-H, Tseng T-Y (2012) IEEE Trans Compon Packag Manuf Technol 2:114310.1109/TCPMT.2012.2194494 ↗
74. Wong MH, Berenov A, Qi X, Kappers MJ, Barber ZH, Llly B, Lockman Z, Ryan MP, Macmanus-Driscoll JL (2003) Nanotechnology 14:96810.1088/0957-4484/14/9/306 ↗
75. Wang Q, Wang G, Jie J, Han X, Hou JG (2005) Thin Solid Films 492:6110.1016/j.tsf.2005.06.046 ↗
76. Yang LL, Zhao QX, Willander M (2009) J Alloys Compd 469:62310.1016/j.jallcom.2008.08.002 ↗
77. Yao I-C, Lin P, Tseng T-Y (2009) Nanotechnology 20:12520210.1088/0957-4484/20/12/125202 ↗
78. Yao I-C, Lin P, Tseng T-Y (2012) IEEE Trans Nanotechnol 11:74610.1109/TNANO.2012.2195502 ↗
79. Sandan VE, Rogers DJ, Tehrani FH, McClintock R, Razeghi M, Drouhin H-J, Clochard MC, Sallet V, Garry G, Fayoud F (2008) Proc SPIE-Int Soc Opt Eng 6895:68950Z10.1117/12.775632 ↗
80. Zhang G, Nakamura A, Aoki T, Temmyo J, Matsui Y (2006) Appl Phys Lett 89:11311210.1063/1.2207832 ↗
81. Kim S-W, Fujita S, Fujita S (2005) Appl Phys Lett 86:15311910.1063/1.1883320 ↗
82. Ye ZZ, Xu WZ, Zhou J, Wang ZL (2007) Solid State Commun 41:464
83. Kim HW, Kim HM, Shim J-H, Cho N-H, Lee C (2005) J Mater Sci: Mater Electron 16:1310.1007/s10854-005-4951-z ↗
84. Liu SM, Gu SL, Zhu SM, Ye JD, Liu W, Zhou X, Zhang R, Shi Y, Zheng YD (2007) J Cryst Growth 299:30310.1016/j.jcrysgro.2006.12.011 ↗
85. Kim S-W, Fujita S, Fujita S (2002) Appl Phys Lett 81:503610.1063/1.1527690 ↗
86. Muthukumar S, Sheng H, Zhong J, Zhang Z, Emanetoglu NW, Lu Y-C (2003) IEEE Trans Nanotechnol 2:5010.1109/TNANO.2003.809120 ↗
87. Kim S-W, Fujita S, Fujita S (2002) Jpn J Appl Phys 41:L54310.1143/JJAP.41.L543 ↗
88. Wu J-J, Liu S-C (2002) Adv Mater 14:21510.1002/1521-4095(20020205)14:3<215::AID-ADMA215>3.0.CO;2-J ↗
89. Yuan H, Zhang Y (2004) J Cryst Growth 263:11910.1016/j.jcrysgro.2003.11.084 ↗
90. Lee W, Jeong M-C, Myoung J-M (2004) Acta Mater 52:394910.1016/j.actamat.2004.05.010 ↗
91. Montenegro DN, Souissi A, Martínez-Tomás C, Muñoz-Sanjosé V, Sallet V (2012) J Cryst Growth 359:12210.1016/j.jcrysgro.2012.08.038 ↗
92. Jeong M-C, Oh B-Y, Lee W, Myoung J-M (2004) J Cryst Growth 268:14910.1016/j.jcrysgro.2004.05.019 ↗
93. Baxter JB, Aydil ES (2005) J Cryst Growth 274:40710.1016/j.jcrysgro.2004.10.014 ↗
94. Park WI, Yi G-C, Kim M, Pennycook SJ (2002) Adv Mater 14:184110.1002/adma.200290015 ↗
95. Pasquier AD, Chen H, Lu Y (2006) Appl Phys Lett 89:25351310.1063/1.2420779 ↗
96. Yin M, Gu Y, Kuskovsky IL, Andelman T, Zhu Y, Neumark GF, O’Brien S (2004) J Am Chem Soc 126:620610.1021/ja031696+ ↗
97. Gu Y, Kuskovsky Igor L, Yin M, O’Brien S, Neumark GF (2004) Appl Phys Lett 85:383310.1063/1.1811797 ↗
98. Gargas DJ, Gao H, Wang H, Yang P (2011) Nano Lett 11:379210.1021/nl201850k ↗
99. Wagner RS, Ellis WC (1964) Appl Phys Lett 4:8910.1063/1.1753975 ↗
100. Scharowski E (1953) Z Phys 135:31810.1007/BF01329276 ↗