journal article·2019-12-24Open access

Velocity Saturation Effect on Low Frequency Noise in Short Channel Single Layer Graphene Field Effect Transistors

Nikolaos Mavredakis, Wei Wei, Emiliano Pallecchi, Dominique Vignaud, Henri Happy, Ramon Garcia Cortadella, Andrea Bonaccini Calia, Jose A. Garrido, David Jiménez

ACS Applied Electronic Materials· Volume 1· Issue 12

Abstract

Graphene devices for analog and radio frequency (RF) applications are prone to low frequency noise (LFN) due to its up conversion to undesired phase noise at higher frequencies. Such applications demand the use of short channel graphene transistors (GFETs) that operate at high electric fields in order to ensure a high speed. Electric field is inversely proportional to device length and proportional to channel potential, so it gets maximized as the drain voltage increases and the transistor’s length shrinks. Under these conditions though, short channel effects like velocity saturation (VS) should be considered. The reduction of LFN data due to the VS effect at short channel GFETs operating at high drain potential is for the first time shown in the present work. Carrier number and mobility fluctuations have been proven to be the main sources that generate LFN in GFETs. While their contribution to the bias dependence of LFN in long channels has been thoroughly investigated, the way in which VS phenomenon affects LFN in short channel devices under high drain voltage conditions has not been well understood. In this paper we have proposed a physics-based analytical LFN model that works under both low and high electric field conditions. The implemented model is validated with experimental data from CVD grown back-gated single layer GFETs operating at gigahertz frequencies. The model accurately captures the reduction of LFN especially near the charge neutrality point because of the effect of the VS mechanism. Moreover, an analytical expression for the effect of contact resistance on LFN is derived. This contact resistance contribution is experimentally shown to be dominant at high gate voltages and is accurately described by the proposed model. The noise parameter related to LFN at contacts is found to have an exponential dependence with contact resistance, and to our knowledge, this is shown for the first time.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Graphene research and applications · Carbon Nanotubes in Composites · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Departament d’Enginyeria Electrònica, Escola d’Enginyeria, Universitat Autònoma de Barcelona, Bellaterra 08193, Spain

Institute of Electronics, Microelectronics and Nanotechnology, CNRS UMR8520, 59652 Villeneuve d’Ascq, France

Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC, Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, Barcelona, Spain

ICREA, Pg. Lluís Companys 23, 08010 Barcelona, Spain

Funding

Ministry of Science, Innovation and Universities · European Commission · Ministerio de Econom??a y Competitividad · Agencia Estatal de Investigaci??n

References (58)

Show source-provided references
1. 10.1126/science.110289610.1126/science.1102896 ↗
2. 10.1038/nmat184910.1038/nmat1849 ↗
3. 10.1038/nnano.2010.8910.1038/nnano.2010.89 ↗
4. 10.1039/C5NR01052G10.1039/C5NR01052G ↗
5. 10.1109/LED.2010.210007410.1109/LED.2010.2100074 ↗
6. Kougianos, E.; Joshi, S.; Mohanty, S. P. Multi-swarm Optimization of a Graphene FET Based Voltage Controlled Oscillator Circuit. 7th Computer Society Annual Symposium on VLSI (ISVLSI); 2015.10.1109/ISVLSI.2015.24 ↗
7. 10.1038/nmat341710.1038/nmat3417 ↗
8. 10.1021/acs.nanolett.7b0362510.1021/acs.nanolett.7b03625 ↗
9. Yang, X.; Vorobiev, A.; Jeppson, K.; Stake, J.; Banszerus, L.; Stampfer, C.; Otto, M.; Neumaier, D. Low-frequency Noise Characterization of Graphene FET THz Detectors. IEEE 43rd International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz), 2018.10.1109/IRMMW-THz.2018.8510404 ↗
10. 10.1038/nmat196710.1038/nmat1967 ↗
11. 10.1109/JPROC.2013.226103110.1109/JPROC.2013.2261031 ↗
12. 10.1021/nl300129310.1021/nl3001293 ↗
13. 10.1002/adfm.20170397610.1002/adfm.201703976 ↗
14. 10.1038/nphoton.2010.18610.1038/nphoton.2010.186 ↗
15. 10.1016/j.carbon.2012.04.05110.1016/j.carbon.2012.04.051 ↗
16. McWhorter A. L. · Semicond. Surf. Phys. · 1957 · 207
17. 10.1063/1.9632510.1063/1.96325 ↗
18. 10.1016/0378-4363(76)90089-910.1016/0378-4363(76)90089-9 ↗
19. 10.1109/T-ED.1984.2168710.1109/T-ED.1984.21687 ↗
20. 10.1016/0038-1101(89)90113-510.1016/0038-1101(89)90113-5 ↗
21. 10.1109/16.4777010.1109/16.47770 ↗
22. Mavredakis, N.; Antonopoulos, A.; Bucher, M. Measurement and Modeling of 1/f Noise in 180 nm NMOS and PMOS Devices. 5th IEEE Europ. Conf. on Circuits & Systems for Communications (ECCSC), 2010; pp 86–89.
23. 10.1038/nnano.2013.14410.1038/nnano.2013.144 ↗
24. 10.1063/1.479484310.1063/1.4794843 ↗
25. 10.1021/nl100985z10.1021/nl100985z ↗
26. 10.1021/nn202749z10.1021/nn202749z ↗
27. 10.1021/nn103273n10.1021/nn103273n ↗
28. 10.1088/0953-8984/22/39/39530210.1088/0953-8984/22/39/395302 ↗
29. 10.1007/s10909-013-0866-x10.1007/s10909-013-0866-x ↗
30. 10.1140/epjb/e2013-40571-710.1140/epjb/e2013-40571-7 ↗
31. 10.1088/1742-5468/2016/05/05401710.1088/1742-5468/2016/05/054017 ↗
32. Mukherjee, C.; Aguirre-Morales, J. D.; Fregonese, S.; Zimmer, T.; Maneux, C.; Happy, H.; Wei, W. Characterization and Modeling of Low-frequency Noise in CVD-grown Graphene FETs. 45th IEEE Europ. Solid State Dev. Res. Conf. (ESSDERC), 2015; pp 176–179.10.1109/ESSDERC.2015.7324742 ↗
33. 10.1021/acsami.6b1586210.1021/acsami.6b15862 ↗
34. 10.1021/nl903665g10.1021/nl903665g ↗
35. 10.1039/C8NR04939D10.1039/C8NR04939D ↗
36. 10.1063/1.492687210.1063/1.4926872 ↗
37. 10.1063/1.367627710.1063/1.3676277 ↗
38. 10.1063/1.480275910.1063/1.4802759 ↗
39. 10.1109/LED.2015.241253610.1109/LED.2015.2412536 ↗
40. Roy, A. S. Noise and small-signal modeling of nanoscale MOSFETs. Thesis No 3921, EPFL, 2007.
41. 10.1038/nnano.2008.26810.1038/nnano.2008.268 ↗
42. 10.1063/1.318274010.1063/1.3182740 ↗
43. 10.1063/1.348313010.1063/1.3483130 ↗
44. 10.1063/1.500368410.1063/1.5003684 ↗
45. 10.1063/1.360658310.1063/1.3606583 ↗
46. 10.1103/PhysRevLett.103.07660110.1103/PhysRevLett.103.076601 ↗
47. 10.1109/LED.2012.223039310.1109/LED.2012.2230393 ↗
48. Feijoo P. C. · arXiv.org · 2019 · arXiv:1910.0830
49. Enz C. · 200610.1002/0470855460 ↗
50. 10.1109/TED.2011.216896010.1109/TED.2011.2168960 ↗
51. 10.1109/TNANO.2014.232878210.1109/TNANO.2014.2328782 ↗
52. 10.1109/TED.2016.257042610.1109/TED.2016.2570426 ↗
53. 10.1109/TED.2015.245965710.1109/TED.2015.2459657 ↗
54. 10.1039/C6NR01521B10.1039/C6NR01521B ↗
55. Wei, W.; Fadil, D.; Pallecchi, E.; Dambrine, G.; Happy, H.; Deng, M.; Fregonese, S.; Zimmer, T. High frequency and noise performance of GFETs. 24th IEEE Int. Conf. on Noise and Fluctuations (ICNF), 2017.10.1109/ICNF.2017.7985969 ↗
56. 10.1016/j.carbon.2015.03.01710.1016/j.carbon.2015.03.017 ↗
57. 10.1088/2053-1583/2/2/02500610.1088/2053-1583/2/2/025006 ↗
58. 10.1109/TED.2017.273644410.1109/TED.2017.2736444 ↗