journal article·2022-01-28

Double Schottky metal–semiconductor–metal based GaN photodetectors with improved response using laser MBE technique

Gunjan Yadav, Vinay Gupta, Monika Tomar

Journal of Materials Research· Volume 37· Issue 2
Publisher page

Abstract

Present work demonstrates the fabrication of Gallium nitride (GaN) based ultraviolet metal–semiconductor–metal (MSM) photodetectors on Si(111) substrate using the Laser MBE technique. MSM photodetectors based on Au, Pd and ITO contacts were fabricated to study the effect of electrodes on the observed UV photoresponse. Temporal response of the fabricated photo-detectors at a regular interval of 20 s ON–OFF cycle revealed that ITO is the best-suited electrode material for the fabrication of photo-detectors with high detectivity, sensitivity and low dark current. The ITO/GaN/ITO double Schottky photodetector showed the maximum responsivity of 0.27 A/W at an applied bias of 1 V towards 325 nm wavelength radiation. The value of detectivity, dark current and the ratio of normalized photocurrent to dark current for ITO/GaN/ITO was found to be 1.73 × 1013Jones, 0.24 pA and 0.8 × 104, which is significantly enhanced as compared to the corresponding values reported by other research groups for MSM photodetectors.Graphical abstract
Source: expertdata · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · Photocathodes and Microchannel Plates

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (66)

Show source-provided references
1. D. Li, X. Sun, H. Song, Z. Li, Y. Chen, G. Miao, H. Jiang, Influence of threading dislocations on GaN-based metal-semiconductor-metal ultraviolet photodetectors. Appl. Phys. Lett. 98(1), 5 (2011)10.1016/j.physletb.2011.06.061 ↗
2. P.F. Satterthwaite, A.S. Yalamarthy, N.A. Scandrette, A.K.M. Newaz, and D.G. Senesky: High responsivity, low dark current ultraviolet photodetector based on AlGaN/GaN interdigitated transducer. Appl. Phys. (2018). http://arxiv.org/abs/2003.0800710.1021/acsphotonics.8b01169 ↗
3. F. Xie, H. Lu, X. Xiu, D. Chen, P. Han, R. Zhang, Y. Zheng, Low dark current and internal gain mechanism of GaN MSM photodetectors fabricated on bulk GaN substrate. Solid. State. Electron. 57(1), 39 (2011)10.1016/j.sse.2010.12.005 ↗
4. C.K. Wang, S.J. Chang, Y.K. Su, Y.Z. Chiou, S.C. Chen, C.S. Chang, T.K. Lin, H.L. Liu, J.J. Tang, GaN MSM UV photodetectors with titanium tungsten transparent electrodes. IEEE Trans. Electron. Dev. 53(1), 38 (2006)10.1109/TED.2005.860780 ↗
5. S.K. Jain, S. Krishna, N. Aggarwal, R. Kumar, A. Gundimeda, S.C. Husale, Effect of metal contacts on a GaN/sapphire-based MSM ultraviolet photodetector. J. Electron. Mater. 47(10), 6086 (2018)10.1007/s11664-018-6501-5 ↗
6. E. Monroy, T. Palacios, O. Hainaut, F. Omnès, F. Calle, J.F. Hochedez, Assessment of GaN metal-semiconductor-metal photodiodes for high-energy ultraviolet photodetection. Appl. Phys. Lett. 80(17), 3198 (2002)10.1063/1.1475362 ↗
7. Y. Chen, J. Liu, K. Liu, J. Si, Y. Ding, L. Li, T. Lv, J. Liu, L. Fu, GaN in different dimensionalities: Properties, synthesis, and applications. Mater. Sci. Eng. R Rep. 138(April), 60 (2019)10.1016/j.mser.2019.04.001 ↗
8. L. Huang, Y. Li, W. Wang, X. Li, Y. Zheng, H. Wang, Z. Zhang, G. Li, Growth of high-quality AlN epitaxial film by optimizing the Si substrate surface. Appl. Surf. Sci. 435, 163 (2018)10.1016/j.apsusc.2017.11.002 ↗
9. H.Z. Xu, Z.G. Wang, M. Kawabe, I. Harrison, B.J. Ansell, C.T. Foxon, Fabrication and characterization of metal-semiconductor-metal (MSM) ultraviolet photodetectors on undoped GaN/sapphire grown by MBE. J. Cryst. Growth 218(1), 1 (2000)10.1016/S0022-0248(00)00540-6 ↗
10. F. Furtmayr, M. Vielemeyer, M. Stutzmann, A. Laufer, B.K. Meyer, M. Eickhoff, Optical properties of Si- and Mg-doped gallium nitride nanowires grown by plasma-assisted molecular beam epitaxy. J. Appl. Phys. 104(7), 223107 (2008)10.1063/1.2980341 ↗
11. R. Raj, V. Vignesh, Y.-H. Ra, R. Nirmala, C.-R. Lee, R. Navamathavan, Growth of hierarchical GaN nanowires for optoelectronic device applications. J. Photonics Energy 7(1), 016001 (2017)10.1117/1.JPE.7.016001 ↗
12. M.Z. Mohd Yusoff, A. Baharin, Z. Hassan, H. Abu Hassan, M.J. Abdullah, MBE growth of GaN pn-junction photodetector on AlN/Si(1 1 1) substrate with Ni/Ag as ohmic contact. Superlatt Microstruct. 56, 35 (2013)10.1016/j.spmi.2012.12.018 ↗
13. L. Liu, C. Yang, A. Patanè, Z. Yu, F. Yan, K. Wang, H. Lu, J. Li, L. Zhao, High-detectivity ultraviolet photodetectors based on laterally mesoporous GaN. Nanoscale 9(24), 8142 (2017)10.1039/C7NR01290J ↗
14. L. Ravikiran, K. Radhakrishnan, N. Dharmarasu, M. Agrawal, Z. Wang, A. Bruno, C. Soci, T. Lihuang, K.S. Ang, GaN Schottky metal-semiconductor-metal UV photodetectors on Si(111) grown by ammonia-MBE. IEEE Sens. J. 17(1), 72 (2017)10.1109/JSEN.2016.2622279 ↗
15. S. Wang, T. Li, J.M. Reifsnider, B. Yang, C. Collins, A.L. Holmes, J.C. Campbell, Schottky metal-semiconductor-metal photodetectors on GaN films grown on sapphire by molecular beam epitaxy. IEEE J. Quantum Electron. 36(11), 1262 (2000)10.1109/3.890266 ↗
16. J. Ohta, H. Fujioka, H. Takahashi, M. Sumiya, M. Oshima, RHEED and XPS study of GaN on Si(1 1 1) grown by pulsed laser deposition. J. Cryst. Growth 233(4), 779 (2001)10.1016/S0022-0248(01)01642-6 ↗
17. R.K. Debnath, R. Meijers, T. Richter, T. Stoica, R. Calarco, H. Lüth, Mechanism of molecular beam epitaxy growth of GaN nanowires on Si(111). Appl. Phys. Lett. 90(12), 1 (2007)10.1063/1.2715119 ↗
18. H. Okumura, K. Balakrishnan, H. Hamaguchi, T. Koizumi, S. Chichibu, H. Nakanishi, T. Nagatomo, S. Yoshida, Analysis of MBE growth mode for GaN epilayers by RHEED. J. Cryst. Growth 189–190, 364 (1998)10.1016/S0022-0248(98)00313-3 ↗
19. N. Grandjean, J. Massies, P. Vennéguès, M. Leroux, F. Demangeot, M. Renucci, J. Frandon, Molecular-beam epitaxy of gallium nitride on (0001) sapphire substrates using ammonia. J. Appl. Phys. 83(3), 1379 (1998)10.1063/1.366840 ↗
20. T. Yamaguchi, T. Sasaki, S. Fujikawa, M. Takahasi, T. Araki, T. Onuma, T. Honda, Y. Nanishi, In situ synchrotron x-ray diffraction reciprocal space mapping measurements in the rf-mbe growth of gainn on gan and inn. Curr. Comput.-Aided Drug Des. 9(12), 631 (2019)
21. X. Wang, A. Yoshikawa, Molecular beam epitaxy growth of GaN, AlN and InN. Prog. Cryst. Growth Charact. Mater. 48–49, 42 (2004)10.1016/j.pcrysgrow.2005.03.002 ↗
22. C. Nörenberg, R.A. Oliver, M.G. Martin, L. Allers, M.R. Castell, G.A.D. Briggs, Stranski-Krastanov growth of InN nanostructures of GaN studied by RHEED, STM and AFM. Phys. Status Solidi Appl. Res. 194, 536 (2002)10.1002/1521-396X(200212)194:2<536::AID-PSSA536>3.0.CO;2-B ↗
23. B. Daudin, F. Widmann, G. Feuillet, Y. Samson, M. Arlery, J. Rouvière, Stranski-Krastanov growth mode during the molecular beam epitaxy of highly strained GaN. Phys. Rev. B. 56(12), R7069 (1997)10.1103/PhysRevB.56.R7069 ↗
24. M. Hardy, D. Feezell, S. Denbaars, S. Nakamura, Group III-nitride lasers: a materials perspective. Mater. Today 14, 408 (2011)10.1016/S1369-7021(11)70185-7 ↗
25. Y. Cai, S. Shen, C. Zhu, X. Zhao, J. Bai, T. Wang, Nonpolar (112̅0) GaN metal–semiconductor–metal photodetectors with superior performance on silicon. ACS Appl. Mater. Interfaces 12(22), 25031 (2020)10.1021/acsami.0c04890 ↗
26. R. Pant, D.K. Singh, A.M. Chowdhury, B. Roul, K.K. Nanda, S.B. Krupanidhi, Highly responsive, self-powered a-GaN based UV-A photodetectors driven by unintentional asymmetrical electrodes. ACS Appl. Electron. Mater. 2(3), 769 (2020)10.1021/acsaelm.9b00834 ↗
27. B.E.B. Al-jumaili, Z.A. Talib, A. Ramizy, N.M. Ahmed, L.Y. Josephine, S.B. Paiman, I.B. Muhd, S.A. Abdulateef, Responsivity dependent anodization current density of nanoporous silicon based MSM photodetector. J. Nanomater. (2016). https://doi.org/10.1155/2016/189036410.1155/2016/1890364 ↗
28. S. Dewan, M. Tomar, R.P. Tandon, V. Gupta, In-situ and post deposition analysis of laser MBE deposited GaN films at varying nitrogen gas flow. Vacuum 164, 72 (2019)10.1016/j.vacuum.2019.02.053 ↗
29. S. Tatarenko, J. Cibert, Y. Gobil, G. Feuillet, K. Saminadayar, A.C. Chami, E. Ligeon, RHEED, XPS, HRTEM and channeling studies of molecular beam epitaxy growth of CdTe On (001) GaAs. Appl. Surf. Sci. 41–42, 470 (1990)10.1016/0169-4332(89)90105-0 ↗
30. K. Oe, S. Ando, K. Sugiyama, Rheed study of InSb films grown by molecular beam epitaxy. Jpn. J. Appl. Phys. 19(7), L417 (1980)10.1143/JJAP.19.L417 ↗
31. X. Diffraction: crystal structure analysis X-ray diffraction electron diffraction neutron diffraction. (n.d.).
32. M. Zhang, Y. Liu, M. Yang, W. Zhang, J. Zhou, Z. Zhang, E. Xie, X. Pan, S. Li, High performance self-powered ultraviolet photodetectors based on electrospun gallium nitride nanowires. Appl. Surf. Sci. 452, 43 (2018)10.1016/j.apsusc.2018.04.225 ↗
33. V.S. Nirwal, K.R. Peta, V.R. Reddy, M.D. Kim, Influence of rapid thermal annealing on electrical and structural properties of Pd/Au Schottky contact to Ga-polarity GaN grown on Si (111) substrate. J. Alloys Compd. 705, 782 (2017)10.1016/j.jallcom.2017.02.162 ↗
34. C. Wurm, E. Ahmadi, F. Wu, N. Hatui, S. Keller, J. Speck, U. Mishra, Growth of high-quality N-polar GaN on bulk GaN by plasma-assisted molecular beam epitaxy. Solid State Commun. 305, 113763 (2020)10.1016/j.ssc.2019.113763 ↗
35. C. Li, J. Li, Z. Li, H. Zhang, Y. Dang, F. Kong, High-performance photodetectors based on nanostructured perovskites. Nanomaterials 11(4), 1038 (2021)10.3390/nano11041038 ↗
36. R. Anitha, R. Ramesh, R. Loganathan, D.S. Vavilapalli, K. Baskar, S. Singh, Large area ultraviolet photodetector on surface modified Si:GaN layers. Appl. Surf. Sci. 435, 1057 (2018)10.1016/j.apsusc.2017.11.097 ↗
37. A. You, M.A.Y. Be, I. In, Red light emission by photoluminescence and electroluminescence from Pr-doped GaN on Si substrates. Appl. Phys. Lett. 74, 2161 (2005)
38. Y.N. Hou, Z. Mei, H. Liang, C. Gu, X. Du, Monolithic color-selective ultraviolet (266–315 nm) photodetector based on wurzite MgxZn1−xO film. Appl. Phys. Lett. 105, 133510 (2014)10.1063/1.4897300 ↗
39. M.A. Alhelfi, N.M. Ahmed, M.R. Hashim, A.A. Al-Rawi, Z. Hassan, Simulation of optimum parameters for GaN MSM UV photodetector. AIP Conf. Proc. 1733, 020028 (2016)10.1063/1.4948846 ↗
40. J.C. Ferrer, J.L. Alonso, S.F. de Ávila, Electrical characterization of photodetectors based on poly(3-hexylthiophene-2, 5-diyl) layers. Sensors (Switzerland) 14(3), 4484 (2014)10.3390/s140304484 ↗
41. T.K. Lin, S.-J. Chang, Y.-K. Su, Y.-Z. Chiou, C.K. Wang, C.M. Chang, B.-R. Huang, ZnSe homoepitaxial MSM photodetectors with transparent ITO contact electrodes. IEEE Trans. Electron Devices 52(1), 121 (2004)
42. P. B. T.-R. M. in M. S. and M. E. Fay: in (Elsevier, 2016).
43. F. So, Organic Electronics: Materials, Devices and Applications (CRC Press, Boca Raton, 2009)10.1201/9781420072914 ↗
44. D. Joung, M. Arif, S. Biswas, S. Kar, S. Santra, S.I. Khondaker, The electronic transport properties of ternary Cd(1–x)Zn(x)S nanowire networks. Nanotechnology 20(44), 445204 (2009)10.1088/0957-4484/20/44/445204 ↗
45. Y.K. Su, S.J. Chang, C.H. Chen, J.F. Chen, G.C. Chi, J.K. Sheu, W.C. Lai, J.M. Tsai, GaN metal-semiconductor-metal ultraviolet sensors with various contact electrodes. IEEE Sens. J. 2(4), 366 (2002)10.1109/JSEN.2002.802240 ↗
46. W. Mou, L. Zhao, L. Chen, D. Yan, H. Ma, G. Yang, X. Gu, GaN-based Schottky barrier ultraviolet photodetectors with graded doping on patterned sapphire substrates. Solid. State. Electron. 133, 78 (2017)10.1016/j.sse.2017.04.008 ↗
47. A.O. Goushcha, B. Tabbert, On response time of semiconductor photodiodes. Opt. Eng. 56(9), 1 (2017)10.1117/1.OE.56.9.097101 ↗
48. K. Ho: Photodetector characteristics in visible light communication. Thesis (2016).
49. C.-J. Lee, C.-H. Won, J.-H. Lee, S.-H. Hahm, H. Park, Sensors 17, 1051 (2017)10.3390/s17051051 ↗
50. N. Aggarwal, S. Krishna, L. Goswami, G. Gupta, Inclination of screw dislocations on the performance of homoepitaxial GaN based UV photodetectors. Mater. Sci. Eng. B 263, 114879 (2021)10.1016/j.mseb.2020.114879 ↗
51. R.S. Pokharia, R. Sarkar, S. Singh, S. Deb, S. Suihkonen, J. Lemettinen, S. Dhar, D. Kabra, A. Laha, A highly sensitive and Robust GaN ultraviolet photodetector fabricated on 150-mm Si (111) wafer. IEEE Trans. Electron Dev. 68(6), 2796 (2021)10.1109/TED.2021.3073650 ↗
52. N.K.R. Nallabala, S. Godavarthi, V.K. Kummara, M.K. Kesarla, C. Yuvaraj, S. Kumar, N. Ravi, G.K. Guntupalli, S.A.K. Jilani, S.V.P. Vattikuti, High performance, self-powered and thermally stable 200–750 nm spectral responsive gallium nitride (GaN) based broadband photodetectors. Sol. Energy Mater. Sol. Cells 225, 111033 (2021)10.1016/j.solmat.2021.111033 ↗
53. Q. An, X. Meng, K. Xiong, and Y. Qiu: Self-powered ZnS nanotubes/Ag nanowires MSM UV photodetector with high on / off ratio and fast response speed. No. March, 1 (2017).10.1038/s41598-017-05176-5 ↗
54. Y. An, A. Behnam, E. Pop, A. Ural, Metal-semiconductor-metal photodetectors based on graphene/p-type silicon Schottky junctions. Appl. Phys. Lett. 102, 013110 (2013)10.1063/1.4773992 ↗
55. L. Goswami, R. Pandey, G. Gupta, Epitaxial growth of GaN nanostructure by PA-MBE for UV detection application. Appl. Surf. Sci. 449, 186 (2018)10.1016/j.apsusc.2018.01.287 ↗
56. D. Li, F. Mechanics, X. Sun, F. Mechanics, H. Song, F. Mechanics, Y.R. Chen, F. Mechanics, Effect of asymmetric Schottky barrier on GaN-based metal-semiconductor- metal ultraviolet detector. Appl. Phys. Lett. (2011). https://doi.org/10.1063/1.367203010.1063/1.3672030 ↗
57. A.K. Okyay, Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures. Optic. Eng. 53, 107106 (2015)
58. E. Devices, Low voltage and high-gain ultraviolet detector based on 4H-SiC n-p-n bipolar phototransistor 1. IEEE Trans. Electron Dev. 68, 2432 (2020)
59. S.K. Jain, N. Aggarwal, S. Krishna, R. Kumar, S. Husale, V. Gupta, GaN-UV photodetector integrated with asymmetric metal semiconductor metal structure for enhanced responsivity. J. Mater. Sci. Mater. Electron. 29(11), 8958 (2018)10.1007/s10854-018-8917-3 ↗
60. Y. Park, V. Choong, Y. Gao, B.R. Hsieh, C.W. Tang, Work function of indium tin oxide transparent conductor measured by photoelectron spectroscopy. Appl. Phys. Lett. 68(19), 2699 (1996)10.1063/1.116313 ↗
61. P.A. Anderson, Work function of gold. Phys. Rev. 115(3), 553 (1959)10.1103/PhysRev.115.553 ↗
62. D. Gu, S.K. Dey, P. Majhi, Effective work function of Pt, Pd, and Re on atomic layer deposited HfO 2. Appl. Phys. Lett. 89(8), 082907 (2006)10.1063/1.2336718 ↗
63. W.J. Zhou, K.J. Jin, H.Z. Guo, C. Ge, M. He, H. Bin-Lu, Electrode effect on high-detectivity ultraviolet photodetectors based on perovskite oxides. J. Appl. Phys. 114(22), 224053 (2013)
64. M. Mosca, J.L. Reverchon, F. Omnés, J.Y. Duboz, Effects of the buffer layers on the performance of (Al, Ga)N ultraviolet photodetectors. J. Appl. Phys. 95(8), 4367 (2004)10.1063/1.1650535 ↗
65. M.D. Brubaker, I. Levin, A.V. Davydov, D.M. Rourke, N.A. Sanford, V.M. Bright, K.A. Bertness, Effect of AlN buffer layer properties on the morphology and polarity of GaN nanowires grown by molecular beam epitaxy. J. Appl. Phys. 110(5), 053506 (2011)10.1063/1.3633522 ↗
66. B.T. Tran, H. Hirayama, M. Jo, N. Maeda, D. Inoue, T. Kikitsu, High-quality AlN template grown on a patterned Si(111) substrate. J. Cryst. Growth 468, 225 (2017)10.1016/j.jcrysgro.2016.12.100 ↗