Directed block copolymer self-assembly for nanoelectronics fabrication
Source abstract
Abstract
This paper provides an overview of directed self-assembly (DSA) options that exhibit potential for enabling extensible high-volume patterning of nanoelectronics devices. It describes the current set of research requirements, which a DSA technology must satisfy to warrant insertion consideration, and summarizes the state-of-the art. The primary focus is on chemical patterning and graphoepitaxial approaches to directing block copolymer (BCP) based assembly. These options exhibit the nearest-term potential, among the emerging DSA technologies, for satisfying projected International Technology Roadmap for Semiconductors (ITRS) patterning requirements. The paper concludes with a selected set of additional challenges, which represent potential barriers to the integration of directed BCP patterning into a nanoelectronics manufacturing line, as well as a few emerging application opportunities for related functional materials. A glossary of acronyms and terms may be found at the end of this manuscript.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Anodic Oxide Films and Nanostructures · Advanced Polymer Synthesis and Characterization
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (100+)
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