journal article·2026

Solution-processed charge-trap/ferroelectric hybrid memory transistor for enhanced data storage and neuromorphic computing

Hayoung Kim, Amos A. Boampong, Yujeong Hwang, Sin-Hyung Lee, Min-Hoi Kim

Journal of Materials Chemistry C· Volume 14· Issue 8
Publisher page

Abstract

Dual-gate multi-bit memory transistors that combine charge-trap and ferroelectric effects are demonstrated as a synaptic memory with high dynamic range.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · Ferroelectric and Piezoelectric Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Creative Convergence Engineering, Hanbat National University, Daejeon 34158, Republic of Korea

School of Advanced Fusion Studies, Department of Intelligent Semiconductor Engineering, University of Seoul, 163 Seoulsiripdaero, Dongdaemun-gu, Seoul, 02504, Republic of Korea

Research Institute of Printed Electronics & 3D Printing, Industry University Cooperation Foundation, Hanbat National University, Daejeon 34158, Republic of Korea

Funding

Ministry of Education · Ministry of Science and ICT, South Korea · University of Seoul

References (48)

Show source-provided references
1. Park · Adv. Mater. · 2020 · 32 · 190355810.1002/adma.201903558 ↗
2. Cho · npj Flexible Electron. · 2025 · 9 · 3410.1038/s41528-025-00415-6 ↗
3. Lee · Nanoscale Horiz. · 2024 · 9 · 147510.1039/D3NH00532A ↗
4. Jung · Adv. Sci. · 2024 · 11 · 230749410.1002/advs.202307494 ↗
5. Fu · Adv. Biosys. · 2018 · 2 · 170019810.1002/adbi.201700198 ↗
6. Wang · Nanoscale Res. Lett. · 2017 · 12 · 34710.1186/s11671-017-2114-9 ↗
7. Ansari · IEEE Trans. Nanotechnol. · 2023 · 22 · 40910.1109/TNANO.2023.3296673 ↗
8. Farronato · Adv. Mater. · 2023 · 35 · 220538110.1002/adma.202205381 ↗
9. Kim · Nano Lett. · 2023 · 23 · 45110.1021/acs.nanolett.2c03453 ↗
10. Cho · J. Flex. Print. Electron. · 2024 · 3 · 6510.56767/jfpe.2024.3.1.65 ↗
11. Kim · Adv. Mater. · 2023 · 35 · 220686410.1002/adma.202206864 ↗
12. Chen · Neuromorph. Comput. Eng. · 2022 · 2 · 02200110.1088/2634-4386/ac57cb ↗
13. Farooq · J. Phys. D: Appl. Phys. · 2025 · 58 · 05510310.1088/1361-6463/ad8f41 ↗
14. Liu · Adv. Mater. · 2024 · 36 · 230558010.1002/adma.202305580 ↗
15. Lee · ACS Appl. Electron. Mater. · 2024 · 6 · 5391
16. Park · ACS Appl. Mater. Interfaces · 2019 · 11 · 832710.1021/acsami.8b20571 ↗
17. Li · Adv. Mater. Interfaces · 2018 · 5 · 170098110.1002/admi.201700981 ↗
18. Liu · ACS Appl. Mater. Interfaces · 2014 · 6 · 1736410.1021/am505602w ↗
19. Park · Adv. Electron. Mater. · 2020 · 6 · 200058210.1002/aelm.202000582 ↗
20. Seo · IEEE Trans. Electron Devices · 2024 · 71 · 302010.1109/TED.2024.3379157 ↗
21. Tsuji · Appl. Phys. Express · 2017 · 10 · 02160110.7567/APEX.10.021601 ↗
22. Q.Lu ; B.Li ; R.Chen and X.Huang Study on the Performance of Amorphous IGZO TFT Thin-Film Transistor with Ti/Au Stacking as the Source/Drain. In 8th International Conference on Signal and Image Processing (ICSIP), 2023, (pp. 995-998). IEEE
23. Boampong · Adv. Electron. Mater. · 2022 · 8 · 210107910.1002/aelm.202101079 ↗
24. Boampong · Adv. Electron. Mater. · 2021 · 7 · 210043010.1002/aelm.202100430 ↗
25. Kim · IEEE Electron Device Lett. · 2023 · 44 · 184110.1109/LED.2023.3314074 ↗
26. Li · Nanoscale · 2020 · 12 · 2315010.1039/D0NR06478E ↗
27. Li · Nano Lett. · 2022 · 22 · 643510.1021/acs.nanolett.2c01768 ↗
28. Hwang · J. Mater. Chem. C · 2025 · 13 · 1123510.1039/D5TC00997A ↗
29. Chang · Org. Electron. · 2009 · 10 · 84910.1016/j.orgel.2009.04.005 ↗
30. Park · J. Alloys Compd. · 2022 · 912 · 16522810.1016/j.jallcom.2022.165228 ↗
31. Zhang · Jpn. J. Appl. Phys. · 2012 · 51 · 04DD0110.1143/JJAP.51.04DD01 ↗
32. Wang · Semicond. Sci. Technol. · 2009 · 24 · 10502910.1088/0268-1242/24/10/105029 ↗
33. Lee · IEEE J. Solid-State Circuits · 2021 · 46 · 9710.1109/JSSC.2010.2084450 ↗
34. Oh · Adv. Intell. Syst. · 2023 · 5 · 220027210.1002/aisy.202200272 ↗
35. Kim · npj Flexible Electron. · 2021 · 5 · 3410.1038/s41528-021-00132-w ↗
36. Kim · Adv. Intell. Syst. · 2022 · 4 · 220011010.1002/aisy.202200110 ↗
37. An · J. Mater. Chem. C · 2023 · 11 · 1458010.1039/D3TC02571C ↗
38. Park · ACS Appl. Mater. Interfaces · 2022 · 14 · 4681910.1021/acsami.2c13780 ↗
39. Kim · Nanoscale · 2020 · 12 · 204010.1039/C9NR08979A ↗
40. Kim · Sci. Rep. · 2019 · 9 · 1170510.1038/s41598-019-48048-w ↗
41. Kim · Jpn. J. Appl. Phys. · 2021 · 60 · 05090510.35848/1347-4065/abf4a0 ↗
42. Zhang · Adv. Electron. Mater. · 2022 · 8 · 210118910.1002/aelm.202101189 ↗
43. Bak · IEEE Electron Device Lett. · 2014 · 35 · 35710.1109/LED.2014.2301800 ↗
44. Kim · ACS Appl. Mater. Interfaces · 2023 · 15 · 5144410.1021/acsami.3c13514 ↗
45. Kim · IEEE Access · 2022 · 10 · 3703010.1109/ACCESS.2022.3157333 ↗
46. Ma · ACS Appl. Electron. Mater. · 2025 · 7 · 331410.1021/acsaelm.5c00020 ↗
47. Song · Adv. Sci. · 2024 · 11 · 230858810.1002/advs.202308588 ↗
48. Kim · Nanoscale Horiz. · 2021 · 6 · 13910.1039/D0NH00559B ↗