Reducing the effects of shot noise using nanoparticles
Source abstract
Abstract
We report a new method to remove the effects of fluctuations in the pattern dimensions caused by statistical variations in the impinging photons/particles at the nanoscale. By using precisely size-controlled nanoparticles as a template in conjunction with resist reflow, the method is capable of reducing the transistor source, drain contact hole dimensions to <20 nm, while remaining compatible with currently available fabrication methods.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Near-Field Optical Microscopy · Nanofabrication and Lithography Techniques · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Portland Technology Development
Intel Corporation Ronler Acres
Hillsboro
USA
Chemistry Department
Portland State University
Portland
Funding
Intel Corporation
References (27)
Show source-provided references
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