journal article·2016

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et 3 Si) 3 As through the GaAs process

Tiina Sarnet, Timo Hatanpää, Mikko Laitinen, Timo Sajavaara, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä

Publisher page

Abstract

A new chemistry has been developed to deposit GaAs, the quintessential compound semiconductor.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Semiconductor Quantum Structures and Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Inorganic Chemistry

Department of Chemistry

University of Helsinki

Finland

Department of Physics

University of Jyväskylä

Division of Material Physics

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