Photoelectrodeposition of patterned cobalt films on silicon substrates

Cobalt films have been electrodeposited directly onto p-type (1 0 0) silicon substrates. Since electrons were required for reduction of the cobalt in solution, deposition only occurred in the presence of illumination. Projection of an optical grating onto the substrate during deposition demonstrated direct patterning of the Co which could lead to novel methods of defining magnetic structures on semiconductor substrates.