journal article·2023Open access

Dual-gate IGZO-based Neuromorphic Transistors with Stacked Al2O3/Chitosan Gate Dielectrics

Jingyu WANG, Changjin WAN, Qing WAN

Journal of Inorganic Materials· Volume 38· Issue 4

Abstract

基于 Al 2 O 3 /Chitosan 叠层栅介质的 双栅 IGZO 神经形态晶体管 王靖瑜 1 , 万昌锦 1 , 万 青 1,2 (1.南京大学 电子科学与工程学院, 南京 210093; 2. 浙江大学 微纳电子学院, 杭州 310027) 摘 要: 基于铟镓锌氧(IGZO)的双电层(EDL)晶体管以低加工温度、 良好的一致性以及丰富的离子动力学等优势, 在 神经形态感知和计算系统中具有极大的潜在应用前景。然而, 双电层 IGZO 晶体管的高漏电(>10 nA)导致的高能耗 以及异常电流尖峰/毛刺一直是相关神经形态计算发展的主要障碍之一。本研究提出了一种具有 Al 2 O 3 /壳聚糖 (Chitosan)叠层栅介质的新型 IGZO 神经形态晶体管。 与单层壳聚糖栅介质晶体管相比, 引入 Al 2 O 3 叠层的器件具有 78.3 mV/decade 的低亚阈值摆幅, 在 1.8 V 电压下 1.3 nA 的低漏电流(降低约 98%), 3.73 V 的大滞回窗口(提升 3.4 倍) 以及 0.86 nA 的低兴奋性突触后电流(降低约 97%), 单脉冲(0.5 V, 20 ms)功耗仅为 1.7 pJ(降低约 96%)。此外, 研究 还基于双栅 EDL 协同调控实现了尖峰突触功能的模拟和沟道电流的有效调制, 并有效规避突触塑性模拟中高漏电 导致的非正常电流尖峰/毛刺。上述结果表明, 堆叠高 k 栅介质可以有效改善神经形态器件的漏电、功耗和性能, 为 进一步开发超低功耗神经形态感知和计算系统提供了新的思路。
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

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