Preparation and properties investigation of AgOx mask films

In this work AgOx mask films for super resolution near-field structure application were prepared by reactive sputtering. The switch properties of AgOx mask films were analyzed by the transmittance property measured by the focused laser thermal effect experimental scheme. Results indicated that the mask films AgOx, had excellent switch properties at low temperature, the reaction AgOx Ag + O2 was reversible, and the mask films were suitable for using in LSC-super-RENS disk. The composition and structure were investigated by X-ray diffraction spectrum and TEM. The results give out that the 200℃ calcined AgOx layers have silver nanometer grains for near-field scattering center.