Electrodeposition of carbon nitride films from solutions of dicyandiamide and DMF

On ITOcoated glass substrates and Si(100) substrates, carbon nitride films were prepared by electrodeposition in which solutions of dicyandiamide and N,Ndimethlformamide were used as electrolytes for the first time. The films were characterized by Xray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy and Xray diffraction (XRD). It was evidented that carbon nitride films were amorphous, the N/C ratio was 0.72 for a typical sample. Three types of chemical bonds between nitrogen and carbon, C-N, C=N, C≡N, appeared in the films, of which C-N, C=N were dominant. Resistivity of samples was 1011 ～1012Ω·cm on Si(100) substrates, 1012～1013Ω·cm on ITOcoated glass substrates. Depositional rate, nitrogen concentration and resistivity of CNx films were different on ITOcoated glass substrate and Si(100) substrate. These results showed that selection of substrate played an important role in the electrodeposition.