Fabrication of Al_2O_3 photosensitive films and micro-patterning microstructures

In this paper,an novel approach for fabricating Al2O3 microstructure based on photosensitive sol-gel and UV laser lithography was introduced.Stabilized and UV photosensitive Al-contained metal chelate and thin films were prepared with Al(O-Sec-Bu)3 and H(C10H12O2) as the precursor and chemical modifier,respectively.The characteristics of UV and IR spectra of the films and their variations in the process of UV irradiation were investigated.The results showed that the gel films had absorption peaks at about 251,321 and 368nm due to the formation of chelate complex.These peaks gradually decreased with irradiation in time,which indicated the photosensitive properties of the Al2O3/H gel films.several size and profile Al2O3 micro-patterning were fabricated by using UV lithography and the minimum line-size obtained in this paper was about 437 nm.