Synthesis and photocuring properties of UV-curable/alkali-soluble acrylic resin
Source abstract
Abstract
An alkali-soluble photosensitive prepolymer was synthesized as photoresist by one-step process.hydroxyethyl acrylate was reacted with phthalic anhydride at different molar ratios,the influences of synthetic process,such as the reaction time,the concentration of catalyst and feeding method were discussed in details.By using a suitable photoinitiator,this resin was polymerized in the exposure of UV light,a series properties of cured film were investigated.For example,it can stand 10% hydrochloric acid for over 30min and be striped in 1% NaOH within 2min.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Photopolymerization techniques and applications · Silicone and Siloxane Chemistry · Advanced Polymer Synthesis and Characterization
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