Influence of current density and pre-treatment of substrate on the preparation of CaMoO_4 thin films by electrochemical technique

The influence of current density and pre-treatment of substrates on the formation of CaMoO_4 thin films prepared by electrochemical technique under constant current density conditions was studied.The results reveal that when the anode oxidation current density is enlarged,the growth speed of CaMoO_4 thin films will be accelerated;whereas the cluster growing trend of CaMoO_4 grains will be aggravated,and the adhesive force and uniformity of as-prepared thin films would be weakened.The different pre-treatment ways of the substrates have great impact on the growth speed of grains,depositing ways as well as the uniformity of the as-prepared CaMoO_4.Furthermore,the depositing speed of CaMoO_4 thin films on the substrate mechanically polished is much faster than that on substrates roughly grinded or polished by using the mixture acids,and the deposition of CaMoO_4 thin films on the substrate mechanically polished will hardly leads to the growth of cluster grains.The results indicate that the optimized electrochemical deposit condition for CaMoO_4 films is the current density about 0.5mA/cm~2 deposited on the substrates polished mechanically.