The influences of deposition pressure on ZnO thin films prepared by cathodic vacuum arc deposition

By using cathodic vacuum arc ion deposition,uniform and compacted ZnO thin films with preferred orientation and high optical transparence were prepared on the slide-glasses substrates.XRD patterns indicate that the ZnO thin films have combined orientation of ZnO(002) and ZnO(101).The preferred orientation of ZnO(002) were obtained at an optimum deposition pressure(1.0Pa).The grain size of ZnO decreases with the deposition pressure increasing.The transparences of ZnO thin films are higher than 80% in the visible light range.The absorption edges are determined to be around 370nm,the corresponding optical band gaps increasing with the deposition pressure increasing,are about 3.33 to 3.40eV.